Nitridation of SiO2 layers in a RTP reactor for embedded applications

J.H. Klootwijk, H. van Kranenburg, P.H. Woerlee, Hans Wallinga

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationBest Western Dish Hotel, Enschede
    Publication statusPublished - 5 Jun 1996

    Keywords

    • METIS-114900

    Cite this

    Klootwijk, J. H., van Kranenburg, H., Woerlee, P. H., & Wallinga, H. (1996, Jun 5). Nitridation of SiO2 layers in a RTP reactor for embedded applications. Best Western Dish Hotel, Enschede.
    Klootwijk, J.H. ; van Kranenburg, H. ; Woerlee, P.H. ; Wallinga, Hans. / Nitridation of SiO2 layers in a RTP reactor for embedded applications. 1996. Best Western Dish Hotel, Enschede.
    @misc{7940c7910ab24110b598c57bb8b81804,
    title = "Nitridation of SiO2 layers in a RTP reactor for embedded applications",
    keywords = "METIS-114900",
    author = "J.H. Klootwijk and {van Kranenburg}, H. and P.H. Woerlee and Hans Wallinga",
    year = "1996",
    month = "6",
    day = "5",
    language = "Undefined",
    type = "Other",

    }

    Klootwijk, JH, van Kranenburg, H, Woerlee, PH & Wallinga, H 1996, Nitridation of SiO2 layers in a RTP reactor for embedded applications. Best Western Dish Hotel, Enschede.

    Nitridation of SiO2 layers in a RTP reactor for embedded applications. / Klootwijk, J.H.; van Kranenburg, H.; Woerlee, P.H.; Wallinga, Hans.

    Best Western Dish Hotel, Enschede. 1996, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Nitridation of SiO2 layers in a RTP reactor for embedded applications

    AU - Klootwijk, J.H.

    AU - van Kranenburg, H.

    AU - Woerlee, P.H.

    AU - Wallinga, Hans

    PY - 1996/6/5

    Y1 - 1996/6/5

    KW - METIS-114900

    M3 - Other contribution

    CY - Best Western Dish Hotel, Enschede

    ER -

    Klootwijk JH, van Kranenburg H, Woerlee PH, Wallinga H. Nitridation of SiO2 layers in a RTP reactor for embedded applications. 1996.