Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers

Research output: Other contributionOther research output

Original languageEnglish
Place of PublicationDijon, France
Publication statusPublished - 2011

Keywords

  • METIS-304944

Cite this

@misc{80c11644d05443a68bf1a065988ca6a2,
title = "Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers",
keywords = "METIS-304944",
author = "J. Bosgra and Andrey Yakshin and Frederik Bijkerk",
year = "2011",
language = "English",
type = "Other",

}

Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers. / Bosgra, J.; Yakshin, Andrey; Bijkerk, Frederik.

Dijon, France. 2011, .

Research output: Other contributionOther research output

TY - GEN

T1 - Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers

AU - Bosgra, J.

AU - Yakshin, Andrey

AU - Bijkerk, Frederik

PY - 2011

Y1 - 2011

KW - METIS-304944

M3 - Other contribution

CY - Dijon, France

ER -