Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors

J. Ackaert; Z. Wang; E. De Backer; P. Colson; P. Coppens

doi:10.1016/S0026-2714(01)00158-5

Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors

J. Ackaert, Z. Wang, E. De Backer, P. Colson, P. Coppens

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Abstract

In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reported. The damage is caused by the build up of charges on an oxide surface during a water rinsing step. The excessive charging over a large capacitator area results in a discharge over the inter metal dielectric layer (IMD) towards a grounded structure. This CID leads to direct severe yield loss. The charging has been detected, measured and reduced with the help of a non contact surface potential measurement.In this way further yield losses have been prevented. A modelfor the relation between the surface charging potential and the voltage difference between the capacitator and the grounded structure is presented.

Original language	English
Pages (from-to)	1403-1407
Number of pages	5
Journal	Microelectronics reliability
Volume	41
Issue number	9-10
DOIs	https://doi.org/10.1016/S0026-2714(01)00158-5
Publication status	Published - 1 Oct 2001
Event	12th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, ESREF 2001 - Bordeaux, France Duration: 1 Oct 2001 → 5 Oct 2001 Conference number: 12

Keywords

IR-67771
METIS-200751
EWI-15613

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/S0026-2714(01)00158-5

Cite this

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title = "Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors",

abstract = "In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reported. The damage is caused by the build up of charges on an oxide surface during a water rinsing step. The excessive charging over a large capacitator area results in a discharge over the inter metal dielectric layer (IMD) towards a grounded structure. This CID leads to direct severe yield loss. The charging has been detected, measured and reduced with the help of a non contact surface potential measurement.In this way further yield losses have been prevented. A modelfor the relation between the surface charging potential and the voltage difference between the capacitator and the grounded structure is presented.",

keywords = "IR-67771, METIS-200751, EWI-15613",

author = "J. Ackaert and Z. Wang and \{De Backer\}, E. and P. Colson and P. Coppens",

year = "2001",

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doi = "10.1016/S0026-2714(01)00158-5",

language = "English",

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journal = "Microelectronics reliability",

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number = "9-10",

note = "12th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, ESREF 2001, ESREF ; Conference date: 01-10-2001 Through 05-10-2001",

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TY - JOUR

T1 - Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors

AU - Ackaert, J.

AU - Wang, Z.

AU - De Backer, E.

AU - Colson, P.

AU - Coppens, P.

N1 - Conference code: 12

PY - 2001/10/1

Y1 - 2001/10/1

N2 - In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reported. The damage is caused by the build up of charges on an oxide surface during a water rinsing step. The excessive charging over a large capacitator area results in a discharge over the inter metal dielectric layer (IMD) towards a grounded structure. This CID leads to direct severe yield loss. The charging has been detected, measured and reduced with the help of a non contact surface potential measurement.In this way further yield losses have been prevented. A modelfor the relation between the surface charging potential and the voltage difference between the capacitator and the grounded structure is presented.

AB - In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reported. The damage is caused by the build up of charges on an oxide surface during a water rinsing step. The excessive charging over a large capacitator area results in a discharge over the inter metal dielectric layer (IMD) towards a grounded structure. This CID leads to direct severe yield loss. The charging has been detected, measured and reduced with the help of a non contact surface potential measurement.In this way further yield losses have been prevented. A modelfor the relation between the surface charging potential and the voltage difference between the capacitator and the grounded structure is presented.

KW - IR-67771

KW - METIS-200751

KW - EWI-15613

U2 - 10.1016/S0026-2714(01)00158-5

DO - 10.1016/S0026-2714(01)00158-5

M3 - Article

SN - 0026-2714

VL - 41

SP - 1403

EP - 1407

JO - Microelectronics reliability

JF - Microelectronics reliability

IS - 9-10

T2 - 12th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, ESREF 2001

Y2 - 1 October 2001 through 5 October 2001

ER -

Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors

Abstract

Keywords

UN SDGs

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