TY - JOUR
T1 - Novel Applications Enabled by Memristors [Guest Editorial]
AU - Kvatinsky, Shahar
AU - Ottavi, Marco
N1 - Publisher Copyright:
© 2007-2011 IEEE.
PY - 2022/4/1
Y1 - 2022/4/1
N2 - Constant advances in semiconductor manufacturing have led to the ubiquitous presence of cheap and reliable computing devices in all aspects of our lives. However, further innovation exclusively based on scaling the CMOS technology feature size will not be sufficient in the coming years, as the well-known Moore's law is slowing down. While CMOS is not going to disappear, it will most likely be supported by several other innovative technologies with stronger performance in specific application scenarios. Among various novel technologies, memristors are emerging as promising devices for high-density memory arrays, neuromorphic computing, and, recently, logic and processing in memory. Recent research also revealed memristor sensitivity to gases and other chemicals. All these developments show that memristors have unexplored potential to shift the paradigm for several other applications.
AB - Constant advances in semiconductor manufacturing have led to the ubiquitous presence of cheap and reliable computing devices in all aspects of our lives. However, further innovation exclusively based on scaling the CMOS technology feature size will not be sufficient in the coming years, as the well-known Moore's law is slowing down. While CMOS is not going to disappear, it will most likely be supported by several other innovative technologies with stronger performance in specific application scenarios. Among various novel technologies, memristors are emerging as promising devices for high-density memory arrays, neuromorphic computing, and, recently, logic and processing in memory. Recent research also revealed memristor sensitivity to gases and other chemicals. All these developments show that memristors have unexplored potential to shift the paradigm for several other applications.
KW - 22/2 OA procedure
UR - http://www.scopus.com/inward/record.url?scp=85127543249&partnerID=8YFLogxK
U2 - 10.1109/MNANO.2022.3141442
DO - 10.1109/MNANO.2022.3141442
M3 - Editorial
AN - SCOPUS:85127543249
SN - 1932-4510
VL - 16
SP - 3
EP - 3
JO - IEEE Nanotechnology Magazine
JF - IEEE Nanotechnology Magazine
IS - 2
ER -