Novel low temperature RF plasma annealing using NH3-N2 gas mixture

Kamal Aïte, F.W. Ragay, J. Middelhoek

    Research output: Contribution to journalArticleAcademicpeer-review

    Original languageEnglish
    Pages (from-to)733-734
    Number of pages2
    JournalElectronics letters
    Volume26
    Issue number11
    Publication statusPublished - 1990

    Keywords

    • METIS-112070

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