Numerical Simulation of wet-chemical etching

C.H. Driesen, J.G.M. Kuerten, H.K. Kuiken, P.J. Zandbergen

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    The concentration of dissolved material in an etch-hole is computed in order to construct a numerical simulation of wet-chemical etching. Using a number of assumptions an approximate convection-diffusion equation is formulated. In this way, analytical descriptions for the concentration in different parts of the domain are obtained. By a coupling of these descriptions the concentration can be computed. The result is validated by comparison with a finite-volume method. Results of the boundary-layer method are given for an etch-hole geometry.
    Original languageEnglish
    Title of host publicationSixteenth International Conference on Numerical Methods in Fluid Dynamics
    Subtitle of host publicationProceedings of the Conference Held in Arcachon, France, 6 – 10 July 1998
    EditorsCharles-Henri Bruneau
    Place of PublicationBerlin, Heidelberg
    PublisherSpringer
    Pages470-475
    ISBN (Electronic)978-3-540-49540-6
    ISBN (Print)978-3-540-65153-6
    DOIs
    Publication statusPublished - 19 Jan 1998
    Event16th International Conference on Numerical Methods in Fluid Dynamics, NMFP 1998 - Arcachon, France
    Duration: 6 Jul 199810 Jul 1998
    Conference number: 16

    Publication series

    NameLecture Notes in Physics
    PublisherSpringer
    Volume515
    ISSN (Print)0075-8450
    ISSN (Electronic)1616-6361

    Conference

    Conference16th International Conference on Numerical Methods in Fluid Dynamics, NMFP 1998
    Abbreviated titleNMFP
    CountryFrance
    CityArcachon
    Period6/07/9810/07/98

    Keywords

    • Boundary-element method
    • Etching

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