On Oxidation Kinetics and Electrical Quality of Gate Oxide Grown in H2O or D2O Ambient

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of Semiconductor Advances for Future Electronics SAFE 2003
Pages	743-747
Number of pages	5
Publication status	Published - 25 Nov 2003

Keywords

@inproceedings{a105835bf5ff4f878c8f2c9424460df3,

title = "On Oxidation Kinetics and Electrical Quality of Gate Oxide Grown in H2O or D2O Ambient",

keywords = "METIS-213270",

author = "A.J. Hof and Kovalgin, {Alexeij Y.} and P.H. Woerlee and Jurriaan Schmitz",

year = "2003",

month = nov,

day = "25",

language = "Undefined",

pages = "743--747",

booktitle = "Proceedings of Semiconductor Advances for Future Electronics SAFE 2003",

}