On Oxidation Kinetics and Electrical Quality of Gate Oxide Grown in H2O or D2O Ambient

A.J. Hof, Alexeij Y. Kovalgin, P.H. Woerlee, Jurriaan Schmitz

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of Semiconductor Advances for Future Electronics SAFE 2003
    Number of pages5
    Publication statusPublished - 25 Nov 2003


    • METIS-213270

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