On the deposition kinetics of the LPCVD gate oxides prepared from SiH4 and O2

J.B. Rem, J.H. Klootwijk, C. Cobianu, J. Holleman, J.F. Verweij

    Research output: Contribution to journalArticleAcademicpeer-review

    Original languageUndefined
    Pages (from-to)C5.113-C5.118
    JournalJournal de physique IV
    Volume5
    Issue numberjuin
    Publication statusPublished - 1995

    Keywords

    • METIS-112058

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