On the kinetic study of electrochemical vapour deposition

L.G.J. de Haart, Y.S. Lin, K.J. de Vries, A.J. Burggraaf

Research output: Contribution to journalArticleAcademicpeer-review

7 Citations (Scopus)
66 Downloads (Pure)

Abstract

A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.
Original languageEnglish
Pages (from-to)331-336
Number of pages6
JournalSolid state ionics
Volume47
Issue number3
DOIs
Publication statusPublished - 1991

Fingerprint Dive into the research topics of 'On the kinetic study of electrochemical vapour deposition'. Together they form a unique fingerprint.

Cite this