Abstract
A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.
Original language | English |
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Pages (from-to) | 331-336 |
Number of pages | 6 |
Journal | Solid state ionics |
Volume | 47 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1991 |