Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

Maksym Tryus*, Konstantin V. Nikolaev, Igor A. Makhotkin, Jürgen Schubert, Lidia Kibkalo, Serhiy Danylyuk, Angelo Giglia, Piergiorgio Nicolosi, Larissa Juschkin

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.

Original languageEnglish
Pages (from-to)94-101
Number of pages8
JournalThin solid films
Early online date25 Apr 2019
Publication statusPublished - 30 Jun 2019


  • Extreme ultraviolet reflectometry
  • Optical constants
  • Orthorhombic LaLuO
  • Thin films characterization
  • 22/4 OA procedure


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