Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

Maksym Tryus; Konstantin V. Nikolaev; Igor A. Makhotkin; Jürgen Schubert; Lidia Kibkalo; Serhiy Danylyuk; Angelo Giglia; Piergiorgio Nicolosi; Larissa Juschkin

doi:10.1016/j.tsf.2019.04.037

Optical and structural characterization of orthorhombic LaLuO₃ using extreme ultraviolet reflectometry

Maksym Tryus^*, Konstantin V. Nikolaev, Igor A. Makhotkin, Jürgen Schubert, Lidia Kibkalo, Serhiy Danylyuk, Angelo Giglia, Piergiorgio Nicolosi, Larissa Juschkin

^*Corresponding author for this work

XUV Optics

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

A thin orthorhombic LaLuO₃ film, grown on SrTiO₃ substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO₃ are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.

Original language	English
Pages (from-to)	94-101
Number of pages	8
Journal	Thin solid films
Volume	680
Early online date	25 Apr 2019
DOIs	https://doi.org/10.1016/j.tsf.2019.04.037
Publication status	Published - 30 Jun 2019

Keywords

Extreme ultraviolet reflectometry
Optical constants
Orthorhombic LaLuO
Thin films characterization
22/4 OA procedure

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10.1016/j.tsf.2019.04.037

1-s2.0-S0040609019302470-mainFinal published version, 1.95 MBLicence: Taverne

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title = "Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry",

abstract = "A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.",

keywords = "Extreme ultraviolet reflectometry, Optical constants, Orthorhombic LaLuO, Thin films characterization, 22/4 OA procedure",

author = "Maksym Tryus and Nikolaev, {Konstantin V.} and Makhotkin, {Igor A.} and J{\"u}rgen Schubert and Lidia Kibkalo and Serhiy Danylyuk and Angelo Giglia and Piergiorgio Nicolosi and Larissa Juschkin",

year = "2019",

month = jun,

day = "30",

doi = "10.1016/j.tsf.2019.04.037",

language = "English",

volume = "680",

pages = "94--101",

journal = "Thin solid films",

issn = "0040-6090",

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TY - JOUR

T1 - Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

AU - Tryus, Maksym

AU - Nikolaev, Konstantin V.

AU - Makhotkin, Igor A.

AU - Schubert, Jürgen

AU - Kibkalo, Lidia

AU - Danylyuk, Serhiy

AU - Giglia, Angelo

AU - Nicolosi, Piergiorgio

AU - Juschkin, Larissa

PY - 2019/6/30

Y1 - 2019/6/30

N2 - A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.

AB - A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.

KW - Extreme ultraviolet reflectometry

KW - Optical constants

KW - Orthorhombic LaLuO

KW - Thin films characterization

KW - 22/4 OA procedure

UR - http://www.scopus.com/inward/record.url?scp=85064819744&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2019.04.037

DO - 10.1016/j.tsf.2019.04.037

M3 - Article

AN - SCOPUS:85064819744

SN - 0040-6090

VL - 680

SP - 94

EP - 101

JO - Thin solid films

JF - Thin solid films

ER -

Optical and structural characterization of orthorhombic LaLuO₃ using extreme ultraviolet reflectometry

Abstract

Keywords

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