Abstract
A process for the production of optical broad band elements for the ultra violet to hard x-ray wavelength range, especially the extreme ultra violet wavelength range is described. A set from series of layers made of at least two materials in relation to the layer sequence is designed and numerical optimization of the the layer thicknesses and of the cap layer thickness is performed. The materials are chosen in such a way that two successive layers interact with each other as little as possible or controllably. The set can be formed from MO2C— and Si-layers. The numerical optimization takes into account interlayers of a certain thickness and composition.
Original language | English |
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Patent number | AU2003226726 |
IPC | G21K 1/ 06 A I |
Priority date | 27/03/03 |
Publication status | Published - 8 Oct 2003 |