Abstract
Focused ion beam (FIB) milling is an emerging technology that enables fast, reliable and well-controlled nanometer-size feature definition. Since the method involves physical removal of material by a beam of ions, the technique can be adapted and optimized almost for any material system.
| Original language | Undefined |
|---|---|
| Title of host publication | Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on |
| Place of Publication | Piscataway |
| Publisher | IEEE |
| Pages | CK.P.1 MON |
| Number of pages | 1 |
| ISBN (Print) | 978-1-4244-4079-5 |
| DOIs | |
| Publication status | Published - 7 Aug 2009 |
| Event | 11th European Quantum Electronics Conference, EQEC 2009 - Munich, Germany Duration: 14 Jun 2009 → 19 Jun 2009 Conference number: 11 http://2009.cleoeurope.org/ |
Publication series
| Name | |
|---|---|
| Publisher | IEEE Computer Society Press |
Conference
| Conference | 11th European Quantum Electronics Conference, EQEC 2009 |
|---|---|
| Abbreviated title | EQEC 2009 |
| Country/Territory | Germany |
| City | Munich |
| Period | 14/06/09 → 19/06/09 |
| Internet address |
Keywords
- METIS-265810
- IOMS-APD: Active Photonic Devices
- EWI-17479
- IR-69968
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