Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications

R.P.P.F. Goetz; N. Van De Wouw; T. Oomen; M.M.J. Van De Wal; B. Sharif; H.J. Zwart

doi:10.1109/CCTA53793.2025.11151477

Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications

R.P.P.F. Goetz
, N. Van De Wouw
, T. Oomen
, M.M.J. Van De Wal
, B. Sharif
, H.J. Zwart

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

The state and output estimation accuracy depends on both the observer and the sensor locations. This paper focuses on this co-design problem in lithography applications. A theoretical formulation of this co-design problem is presented and solved for discrete-time linear stochastic models. We compare the optimal solution of two variants of the estimation problem. The first variant minimizes the transient estimation error whereas the second one minimizes the steady-state estimation error. In both cases, the Kalman filter is optimal. While solving these problems for a lithography application formulated as a 3D thermoelastic model, we observe a significant difference between the optimal sensor placements. Our results highlight the importance of designing a sensor layout in line with the desired transient or steady-state estimation performance.

Original language	English
Title of host publication	2025 IEEE Conference on Control Technology and Applications, CCTA 2025
Editors	Christopher Vermillion, Sorin Olaru, Johanna Mathieu, Mehmet Mercangoz, Stephanie Stockar, Alireza Karimi, Timm Faulwasser, Eric Kerrigan, Rolf Fineisen, Sebastien Gros, Ionela Prodan, Christopher Edwards, Fabrizio Dabbene, Airlie Chapman, Behrouz Touri
Publisher	IEEE
Pages	321-326
Number of pages	6
ISBN (Electronic)	9798331539085
DOIs	https://doi.org/10.1109/CCTA53793.2025.11151477
Publication status	Published - 2025
Event	9th IEEE Conference on Control Technology and Applications, CCTA 2025 - San Diego, United States Duration: 25 Aug 2025 → 27 Aug 2025 Conference number: 9 https://ccta2025.ieeecss.org/

Publication series

Name	2025 IEEE Conference on Control Technology and Applications, CCTA 2025

Conference

Conference	9th IEEE Conference on Control Technology and Applications, CCTA 2025
Abbreviated title	IEEE CCTA 2025
Country/Territory	United States
City	San Diego
Period	25/08/25 → 27/08/25
Internet address	https://ccta2025.ieeecss.org/

Keywords

2025 OA procedure

Access to Document

10.1109/CCTA53793.2025.11151477

Cite this

Goetz, R. P. P. F., Van De Wouw, N., Oomen, T., Van De Wal, M. M. J., Sharif, B., & Zwart, H. J. (2025). Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications. In C. Vermillion, S. Olaru, J. Mathieu, M. Mercangoz, S. Stockar, A. Karimi, T. Faulwasser, E. Kerrigan, R. Fineisen, S. Gros, I. Prodan, C. Edwards, F. Dabbene, A. Chapman, & B. Touri (Eds.), 2025 IEEE Conference on Control Technology and Applications, CCTA 2025 (pp. 321-326). (2025 IEEE Conference on Control Technology and Applications, CCTA 2025). IEEE. https://doi.org/10.1109/CCTA53793.2025.11151477

Goetz, R.P.P.F. ; Van De Wouw, N. ; Oomen, T. et al. / Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications. 2025 IEEE Conference on Control Technology and Applications, CCTA 2025. editor / Christopher Vermillion ; Sorin Olaru ; Johanna Mathieu ; Mehmet Mercangoz ; Stephanie Stockar ; Alireza Karimi ; Timm Faulwasser ; Eric Kerrigan ; Rolf Fineisen ; Sebastien Gros ; Ionela Prodan ; Christopher Edwards ; Fabrizio Dabbene ; Airlie Chapman ; Behrouz Touri. IEEE, 2025. pp. 321-326 (2025 IEEE Conference on Control Technology and Applications, CCTA 2025).

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title = "Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications",

abstract = "The state and output estimation accuracy depends on both the observer and the sensor locations. This paper focuses on this co-design problem in lithography applications. A theoretical formulation of this co-design problem is presented and solved for discrete-time linear stochastic models. We compare the optimal solution of two variants of the estimation problem. The first variant minimizes the transient estimation error whereas the second one minimizes the steady-state estimation error. In both cases, the Kalman filter is optimal. While solving these problems for a lithography application formulated as a 3D thermoelastic model, we observe a significant difference between the optimal sensor placements. Our results highlight the importance of designing a sensor layout in line with the desired transient or steady-state estimation performance.",

keywords = "2025 OA procedure",

author = "R.P.P.F. Goetz and \{Van De Wouw\}, N. and T. Oomen and \{Van De Wal\}, M.M.J. and B. Sharif and H.J. Zwart",

note = "Publisher Copyright: {\textcopyright} 2025 IEEE.; 9th IEEE Conference on Control Technology and Applications, CCTA 2025, IEEE CCTA 2025 ; Conference date: 25-08-2025 Through 27-08-2025",

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doi = "10.1109/CCTA53793.2025.11151477",

language = "English",

series = "2025 IEEE Conference on Control Technology and Applications, CCTA 2025",

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pages = "321--326",

editor = "Christopher Vermillion and Sorin Olaru and Johanna Mathieu and Mehmet Mercangoz and Stephanie Stockar and Alireza Karimi and Timm Faulwasser and Eric Kerrigan and Rolf Fineisen and Sebastien Gros and Ionela Prodan and Christopher Edwards and Fabrizio Dabbene and Airlie Chapman and Behrouz Touri",

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Goetz, RPPF, Van De Wouw, N, Oomen, T, Van De Wal, MMJ, Sharif, B & Zwart, HJ 2025, Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications. in C Vermillion, S Olaru, J Mathieu, M Mercangoz, S Stockar, A Karimi, T Faulwasser, E Kerrigan, R Fineisen, S Gros, I Prodan, C Edwards, F Dabbene, A Chapman & B Touri (eds), 2025 IEEE Conference on Control Technology and Applications, CCTA 2025. 2025 IEEE Conference on Control Technology and Applications, CCTA 2025, IEEE, pp. 321-326, 9th IEEE Conference on Control Technology and Applications, CCTA 2025, San Diego, California, United States, 25/08/25. https://doi.org/10.1109/CCTA53793.2025.11151477

Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications. / Goetz, R.P.P.F.; Van De Wouw, N.; Oomen, T. et al.
2025 IEEE Conference on Control Technology and Applications, CCTA 2025. ed. / Christopher Vermillion; Sorin Olaru; Johanna Mathieu; Mehmet Mercangoz; Stephanie Stockar; Alireza Karimi; Timm Faulwasser; Eric Kerrigan; Rolf Fineisen; Sebastien Gros; Ionela Prodan; Christopher Edwards; Fabrizio Dabbene; Airlie Chapman; Behrouz Touri. IEEE, 2025. p. 321-326 (2025 IEEE Conference on Control Technology and Applications, CCTA 2025).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications

AU - Goetz, R.P.P.F.

AU - Van De Wouw, N.

AU - Oomen, T.

AU - Van De Wal, M.M.J.

AU - Sharif, B.

AU - Zwart, H.J.

N1 - Conference code: 9

PY - 2025

Y1 - 2025

N2 - The state and output estimation accuracy depends on both the observer and the sensor locations. This paper focuses on this co-design problem in lithography applications. A theoretical formulation of this co-design problem is presented and solved for discrete-time linear stochastic models. We compare the optimal solution of two variants of the estimation problem. The first variant minimizes the transient estimation error whereas the second one minimizes the steady-state estimation error. In both cases, the Kalman filter is optimal. While solving these problems for a lithography application formulated as a 3D thermoelastic model, we observe a significant difference between the optimal sensor placements. Our results highlight the importance of designing a sensor layout in line with the desired transient or steady-state estimation performance.

AB - The state and output estimation accuracy depends on both the observer and the sensor locations. This paper focuses on this co-design problem in lithography applications. A theoretical formulation of this co-design problem is presented and solved for discrete-time linear stochastic models. We compare the optimal solution of two variants of the estimation problem. The first variant minimizes the transient estimation error whereas the second one minimizes the steady-state estimation error. In both cases, the Kalman filter is optimal. While solving these problems for a lithography application formulated as a 3D thermoelastic model, we observe a significant difference between the optimal sensor placements. Our results highlight the importance of designing a sensor layout in line with the desired transient or steady-state estimation performance.

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BT - 2025 IEEE Conference on Control Technology and Applications, CCTA 2025

A2 - Vermillion, Christopher

A2 - Olaru, Sorin

A2 - Mathieu, Johanna

A2 - Mercangoz, Mehmet

A2 - Stockar, Stephanie

A2 - Karimi, Alireza

A2 - Faulwasser, Timm

A2 - Kerrigan, Eric

A2 - Fineisen, Rolf

A2 - Gros, Sebastien

A2 - Prodan, Ionela

A2 - Edwards, Christopher

A2 - Dabbene, Fabrizio

A2 - Chapman, Airlie

A2 - Touri, Behrouz

PB - IEEE

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Goetz RPPF, Van De Wouw N, Oomen T, Van De Wal MMJ, Sharif B, Zwart HJ. Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications. In Vermillion C, Olaru S, Mathieu J, Mercangoz M, Stockar S, Karimi A, Faulwasser T, Kerrigan E, Fineisen R, Gros S, Prodan I, Edwards C, Dabbene F, Chapman A, Touri B, editors, 2025 IEEE Conference on Control Technology and Applications, CCTA 2025. IEEE. 2025. p. 321-326. (2025 IEEE Conference on Control Technology and Applications, CCTA 2025). doi: 10.1109/CCTA53793.2025.11151477

Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications

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