Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

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Abstract

In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.
Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components VIII
EditorsAli Khounsary, Shunji Goto, Christian Morawe
PublisherSPIE
Pages1-5
Number of pages5
ISBN (Print)9780819496980
DOIs
Publication statusPublished - 25 Aug 2013
EventSPIE Optical Engineering + Applications 2013 - San Diego Convention Center, San Diego, United States
Duration: 25 Aug 201329 Aug 2013

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume8848
ISSN (Print)0277-786X

Conference

ConferenceSPIE Optical Engineering + Applications 2013
CountryUnited States
CitySan Diego
Period25/08/1329/08/13

Keywords

  • METIS-299279
  • IR-88107

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