Optimization of Low-Loss AL2O3 Waveguide Fabrication for Application in Active Integrated Optical Devices

K. Wörhoff; F. Ay; M. Pollnau

doi:10.1149/1.2392916

Optimization of Low-Loss AL₂O₃ Waveguide Fabrication for Application in Active Integrated Optical Devices

K. Wörhoff, F. Ay, M. Pollnau

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

15 Citations (Scopus)

265 Downloads (Pure)

Abstract

In this paper we will present the fabrication and properties of reactively co-sputtered AL₂O₃ layers, being a very promising host material for active integrated optics applications such as rare-earth ion doped laser devices. The process optimization towards a reactive co-sputtering process, which resulted in stable, target condition-independent deposition of AL₂O₃AL₂ with high optical quality will be discussed in detail. The loss value of as-deposited optical waveguides sputtered by the optimized process has been measured. The loss in the near infrared wavelength range was 0.3 dB/cm. Furthermore AL₂O₃ material hosts fabricated by sputtering techniques are compatible with Si-based integrated optical technology and allow for uniform deposition over a large substrate area.

Original language	English
Title of host publication	Science and Technology of Dielectrics for Active and Passive Photonic Devices
Editors	P. Masscher, K. Wörhoff, D. Misra
Place of Publication	Pennington, NJ
Publisher	Electrochemical Society
Pages	17-26
Number of pages	10
ISBN (Print)	1-56677-515-9
DOIs	https://doi.org/10.1149/1.2392916
Publication status	Published - 2006
Event	210th Electrochemical Society Meeting, ECS 2006 - Cancún, Mexico Duration: 29 Oct 2006 → 3 Nov 2006

Publication series

Name	ECS Transactions
Publisher	Electrochemical Society, Inc.
Number	11
Volume	3

Conference

Conference	210th Electrochemical Society Meeting, ECS 2006
Abbreviated title	ECS 2006
Country/Territory	Mexico
City	Cancún
Period	29/10/06 → 3/11/06

Keywords

IOMS-APD: Advanced Photonic Devices

Access to Document

10.1149/1.2392916

Wörhoff2006optimizationAccepted author version, 521 KB

Cite this

Wörhoff, K., Ay, F., & Pollnau, M. (2006). Optimization of Low-Loss AL₂O₃ Waveguide Fabrication for Application in Active Integrated Optical Devices. In P. Masscher, K. Wörhoff, & D. Misra (Eds.), Science and Technology of Dielectrics for Active and Passive Photonic Devices (pp. 17-26). (ECS Transactions; Vol. 3, No. 11). Electrochemical Society. https://doi.org/10.1149/1.2392916

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abstract = "In this paper we will present the fabrication and properties of reactively co-sputtered AL2O3 layers, being a very promising host material for active integrated optics applications such as rare-earth ion doped laser devices. The process optimization towards a reactive co-sputtering process, which resulted in stable, target condition-independent deposition of AL2O3AL2 with high optical quality will be discussed in detail. The loss value of as-deposited optical waveguides sputtered by the optimized process has been measured. The loss in the near infrared wavelength range was 0.3 dB/cm. Furthermore AL2O3 material hosts fabricated by sputtering techniques are compatible with Si-based integrated optical technology and allow for uniform deposition over a large substrate area.",

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Wörhoff, K, Ay, F & Pollnau, M 2006, Optimization of Low-Loss AL₂O₃ Waveguide Fabrication for Application in Active Integrated Optical Devices. in P Masscher, K Wörhoff & D Misra (eds), Science and Technology of Dielectrics for Active and Passive Photonic Devices. ECS Transactions, no. 11, vol. 3, Electrochemical Society, Pennington, NJ, pp. 17-26, 210th Electrochemical Society Meeting, ECS 2006, Cancún, Mexico, 29/10/06. https://doi.org/10.1149/1.2392916

Optimization of Low-Loss AL₂O₃ Waveguide Fabrication for Application in Active Integrated Optical Devices. / Wörhoff, K.; Ay, F.; Pollnau, M.
Science and Technology of Dielectrics for Active and Passive Photonic Devices. ed. / P. Masscher; K. Wörhoff; D. Misra. Pennington, NJ: Electrochemical Society, 2006. p. 17-26 (ECS Transactions; Vol. 3, No. 11).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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