Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Kerstin Worhoff, Paul Lambeck, O.F.J. Noordman, O.F.J. Noordman, N.F. van Hulst, T.J.A. Popma

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

18 Citations (Scopus)

Abstract

The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.
Original languageUndefined
Title of host publicationProceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications
EditorsOlivier M. Parriaux, Ernst-Bernhard Kley
PublisherSPIE
Pages257-268
DOIs
Publication statusPublished - 20 Jun 1997

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume3099
ISSN (Print)0277-786X

Keywords

  • METIS-130220
  • IR-25418

Cite this

Worhoff, K., Lambeck, P., Noordman, O. F. J., Noordman, O. F. J., van Hulst, N. F., & Popma, T. J. A. (1997). Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In O. M. Parriaux, & E-B. Kley (Eds.), Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications (pp. 257-268). (Proceedings of SPIE; Vol. 3099). SPIE. https://doi.org/10.1117/12.281235