Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

K. Wörhoff; P.V. Lambeck; O.F.J. Noordman; N.F. van Hulst; Th.J.A. Popma

doi:10.1117/12.281235

Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

K. Wörhoff
, P.V. Lambeck
, O.F.J. Noordman
, N.F. van Hulst
, Th.J.A. Popma

Optical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

20 Citations (Scopus)

5 Downloads (Pure)

Abstract

The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.

Original language	English
Title of host publication	Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications
Editors	Olivier M. Parriaux, Ernst-Bernhard Kley
Publisher	SPIE
Pages	257-268
DOIs	https://doi.org/10.1117/12.281235
Publication status	Published - 20 Jun 1997
Event	Lasers and Optics in Manufacturing III, 1997 - Munich, Germany Duration: 16 Jun 1997 → 20 Jun 1997 Conference number: 3

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	3099
ISSN (Print)	0277-786X

Conference

Conference	Lasers and Optics in Manufacturing III, 1997
Country/Territory	Germany
City	Munich
Period	16/06/97 → 20/06/97

Access to Document

10.1117/12.281235

Cite this

Wörhoff, K., Lambeck, P. V., Noordman, O. F. J., van Hulst, N. F., & Popma, T. J. A. (1997). Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In O. M. Parriaux, & E.-B. Kley (Eds.), Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications (pp. 257-268). (Proceedings of SPIE; Vol. 3099). SPIE. https://doi.org/10.1117/12.281235

Wörhoff, K. ; Lambeck, P.V. ; Noordman, O.F.J. et al. / Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications. editor / Olivier M. Parriaux ; Ernst-Bernhard Kley. SPIE, 1997. pp. 257-268 (Proceedings of SPIE).

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title = "Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity",

abstract = "The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.",

author = "K. W{\"o}rhoff and P.V. Lambeck and O.F.J. Noordman and \{van Hulst\}, N.F. and Th.J.A. Popma",

year = "1997",

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doi = "10.1117/12.281235",

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series = "Proceedings of SPIE",

publisher = "SPIE",

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editor = "Parriaux, \{Olivier M.\} and Ernst-Bernhard Kley",

booktitle = "Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications",

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note = "Lasers and Optics in Manufacturing III, 1997 ; Conference date: 16-06-1997 Through 20-06-1997",

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Wörhoff, K, Lambeck, PV, Noordman, OFJ, van Hulst, NF & Popma, TJA 1997, Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. in OM Parriaux & E-B Kley (eds), Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications. Proceedings of SPIE, vol. 3099, SPIE, pp. 257-268, Lasers and Optics in Manufacturing III, 1997, Munich, Germany, 16/06/97. https://doi.org/10.1117/12.281235

Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. / Wörhoff, K.; Lambeck, P.V.; Noordman, O.F.J. et al.
Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications. ed. / Olivier M. Parriaux; Ernst-Bernhard Kley. SPIE, 1997. p. 257-268 (Proceedings of SPIE; Vol. 3099).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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N2 - The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.

AB - The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.

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M3 - Conference contribution

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BT - Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications

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Wörhoff K, Lambeck PV, Noordman OFJ, van Hulst NF, Popma TJA. Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In Parriaux OM, Kley EB, editors, Proceedings Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications. SPIE. 1997. p. 257-268. (Proceedings of SPIE). doi: 10.1117/12.281235

Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

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