Optimization of Si and GexS1-x crystallization with furnace and rapid thermal anneals for thin film transistors

J.B. Rem, M.C.V. de Leuw, J. Holleman, J.F. Verweij

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings 190th Electrochemical Society Meeting
    Place of PublicationSan Antonio Texas USA
    Publication statusPublished - 26 Jan 1997


    • METIS-113862

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