Oxidation and metal contamination of EUV optics

Research output: Contribution to conferencePosterOther research output

Abstract

The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.
Original languageUndefined
Pages-
Publication statusPublished - 9 Dec 2013
EventM2I Conference 2013: Tertiary Oxidation and metal contamination of EUV optics - Noordwijkerhout, The Netherlands
Duration: 9 Dec 201310 Dec 2013

Conference

ConferenceM2I Conference 2013
CityNoordwijkerhout, The Netherlands
Period9/12/1310/12/13

Keywords

  • METIS-299694

Cite this

Sturm, J. M., Liu, F., Pachecka, M., Lee, C. J., & Bijkerk, F. (2013). Oxidation and metal contamination of EUV optics. -. Poster session presented at M2I Conference 2013, Noordwijkerhout, The Netherlands, .
Sturm, Jacobus Marinus ; Liu, Feng ; Pachecka, Malgorzata ; Lee, Christopher James ; Bijkerk, Frederik. / Oxidation and metal contamination of EUV optics. Poster session presented at M2I Conference 2013, Noordwijkerhout, The Netherlands, .
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title = "Oxidation and metal contamination of EUV optics",
abstract = "The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.",
keywords = "METIS-299694",
author = "Sturm, {Jacobus Marinus} and Feng Liu and Malgorzata Pachecka and Lee, {Christopher James} and Frederik Bijkerk",
year = "2013",
month = "12",
day = "9",
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pages = "--",
note = "null ; Conference date: 09-12-2013 Through 10-12-2013",

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Sturm, JM, Liu, F, Pachecka, M, Lee, CJ & Bijkerk, F 2013, 'Oxidation and metal contamination of EUV optics' M2I Conference 2013, Noordwijkerhout, The Netherlands, 9/12/13 - 10/12/13, pp. -.

Oxidation and metal contamination of EUV optics. / Sturm, Jacobus Marinus; Liu, Feng; Pachecka, Malgorzata; Lee, Christopher James; Bijkerk, Frederik.

2013. - Poster session presented at M2I Conference 2013, Noordwijkerhout, The Netherlands, .

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Oxidation and metal contamination of EUV optics

AU - Sturm, Jacobus Marinus

AU - Liu, Feng

AU - Pachecka, Malgorzata

AU - Lee, Christopher James

AU - Bijkerk, Frederik

PY - 2013/12/9

Y1 - 2013/12/9

N2 - The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.

AB - The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.

KW - METIS-299694

M3 - Poster

SP - -

ER -

Sturm JM, Liu F, Pachecka M, Lee CJ, Bijkerk F. Oxidation and metal contamination of EUV optics. 2013. Poster session presented at M2I Conference 2013, Noordwijkerhout, The Netherlands, .