Oxidation and metal contamination of EUV optics

Jacobus Marinus Sturm, Feng Liu, Malgorzata Pachecka, Christopher James Lee, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output


The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.
Original languageUndefined
Publication statusPublished - 9 Dec 2013
EventM2I Conference 2013: Tertiary Oxidation and metal contamination of EUV optics - Noordwijkerhout, The Netherlands
Duration: 9 Dec 201310 Dec 2013


ConferenceM2I Conference 2013
CityNoordwijkerhout, The Netherlands


  • METIS-299694

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