The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding of contamination and cleaning reactions.
|Publication status||Published - 9 Dec 2013|
|Event||M2I Conference 2013: Tertiary Oxidation and metal contamination of EUV optics - Noordwijkerhout, The Netherlands|
Duration: 9 Dec 2013 → 10 Dec 2013
|Conference||M2I Conference 2013|
|City||Noordwijkerhout, The Netherlands|
|Period||9/12/13 → 10/12/13|