Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

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Abstract

In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.
Original languageUndefined
Pages (from-to)15560-15561
Number of pages2
JournalJournal of the American Chemical Society
Volume128
Issue number49
DOIs
Publication statusPublished - 2006

Keywords

  • IR-73062
  • METIS-236150

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