Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

Research output: Contribution to journalArticleAcademicpeer-review

3 Citations (Scopus)

Abstract

In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.
Original languageUndefined
Pages (from-to)15560-15561
Number of pages2
JournalJournal of the American Chemical Society
Volume128
Issue number49
DOIs
Publication statusPublished - 2006

Keywords

  • IR-73062
  • METIS-236150

Cite this

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title = "Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing",
abstract = "In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.",
keywords = "IR-73062, METIS-236150",
author = "R.B.A. Sharpe and Dirk Burdinski and Jurriaan Huskens and Zandvliet, {Henricus J.W.} and David Reinhoudt and Bene Poelsema",
year = "2006",
doi = "10.1021/ja065291b",
language = "Undefined",
volume = "128",
pages = "15560--15561",
journal = "Journal of the American Chemical Society",
issn = "0002-7863",
publisher = "American Chemical Society",
number = "49",

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Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing. / Sharpe, R.B.A.; Burdinski, Dirk; Huskens, Jurriaan; Zandvliet, Henricus J.W.; Reinhoudt, David; Poelsema, Bene.

In: Journal of the American Chemical Society, Vol. 128, No. 49, 2006, p. 15560-15561.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

AU - Sharpe, R.B.A.

AU - Burdinski, Dirk

AU - Huskens, Jurriaan

AU - Zandvliet, Henricus J.W.

AU - Reinhoudt, David

AU - Poelsema, Bene

PY - 2006

Y1 - 2006

N2 - In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.

AB - In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.

KW - IR-73062

KW - METIS-236150

U2 - 10.1021/ja065291b

DO - 10.1021/ja065291b

M3 - Article

VL - 128

SP - 15560

EP - 15561

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

SN - 0002-7863

IS - 49

ER -