Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

R.B.A. Sharpe; Dirk Burdinski; Jurriaan Huskens; Henricus J.W. Zandvliet; David Reinhoudt; Bene Poelsema

doi:10.1021/ja065291b

Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing

R.B.A. Sharpe, Dirk Burdinski, Jurriaan Huskens, Henricus J.W. Zandvliet, David Reinhoudt, Bene Poelsema

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.

Original language	Undefined
Pages (from-to)	15560-15561
Number of pages	2
Journal	Journal of the American Chemical Society
Volume	128
Issue number	49
DOIs	https://doi.org/10.1021/ja065291b
Publication status	Published - 2006

Keywords

IR-73062
METIS-236150

Access to Document

10.1021/ja065291b

Cite this

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abstract = "In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.",

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AU - Sharpe, R.B.A.

AU - Burdinski, Dirk

AU - Huskens, Jurriaan

AU - Zandvliet, Henricus J.W.

AU - Reinhoudt, David

AU - Poelsema, Bene

PY - 2006

Y1 - 2006

N2 - In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.

AB - In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.

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KW - METIS-236150

U2 - 10.1021/ja065291b

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