Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry

E.A.F. Span; Herbert Wormeester; David H.A. Blank; Horst Rogalla

doi:10.1016/S0921-5107(98)00223-2

Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry

E.A.F. Span, Herbert Wormeester, David H.A. Blank, Horst Rogalla

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T¿300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.

Original language	Undefined
Pages (from-to)	123-129
Number of pages	7
Journal	Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume	56
Issue number	56
DOIs	https://doi.org/10.1016/S0921-5107(98)00223-2
Publication status	Published - 1998

Keywords

METIS-128802
IR-24003

Access to Document

10.1016/S0921-5107(98)00223-2

Cite this

@article{f934ef010c7a40e99b0f883048d091ba,

title = "Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry",

abstract = "In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T¿300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.",

keywords = "METIS-128802, IR-24003",

author = "E.A.F. Span and Herbert Wormeester and Blank, {David H.A.} and Horst Rogalla",

year = "1998",

doi = "10.1016/S0921-5107(98)00223-2",

language = "Undefined",

volume = "56",

pages = "123--129",

journal = "Materials Science and Engineering B: Solid-State Materials for Advanced Technology",

issn = "0921-5107",

publisher = "Elsevier Ltd",

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TY - JOUR

T1 - Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry

AU - Span, E.A.F.

AU - Wormeester, Herbert

AU - Blank, David H.A.

AU - Rogalla, Horst

PY - 1998

Y1 - 1998

N2 - In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T¿300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.

AB - In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T¿300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.

KW - METIS-128802

KW - IR-24003

U2 - 10.1016/S0921-5107(98)00223-2

DO - 10.1016/S0921-5107(98)00223-2

M3 - Article

SN - 0921-5107

VL - 56

SP - 123

EP - 129

JO - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

JF - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

IS - 56

ER -