Oxygen in Complex Oxide Thin Films Grown by Pulsed Laser Deposition: a Perspective

Gertjan Koster*, Dave H.A. Blank, Guus A.J.H.M. Rijnders

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

8 Citations (Scopus)
172 Downloads (Pure)


For thin film synthesis of complex oxides, one of the most important issues has always been how to oxidise the material. For a technique like pulsed laser deposition, a key benefit is the relatively high oxygen background pressure one can operate at, and therefor oxidation should be relatively straightforward. However, understanding the microscopic oxidation mechanisms turns out to be rather difficult. In this perspective, we give a brief overview of the sources of oxidation for complex oxide thin films grown by pulsed laser deposition. While it is clear what these sources are, their role in the kinetics of the formation of the crystal structure and oxygen stoichiometry is not fully understood.

Original languageEnglish
Pages (from-to)205-212
Number of pages8
JournalJournal of superconductivity and novel magnetism
Early online date16 Oct 2019
Publication statusPublished - 1 Jan 2020


  • UT-Hybrid-D
  • High Tc superconductors
  • Oxidation
  • Pulsed laser deposition
  • Thin films
  • Complex oxides


Dive into the research topics of 'Oxygen in Complex Oxide Thin Films Grown by Pulsed Laser Deposition: a Perspective'. Together they form a unique fingerprint.

Cite this