Particles in Semiconductor Processing

D. Martin Knotter; F. Wali

doi:10.1016/B978-1-4377-7830-4.10003-9

Particles in Semiconductor Processing

D. Martin Knotter, F. Wali

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic › peer-review

7 Citations (Scopus)

Abstract

Advances in integrated circuits (ICs) have a high impact on society. These advances result in continuously increasing performance of home personal computers, higher density flash memory chips, faster wireless communication in combination with smaller antennas, and all kinds of combinations of the aforementioned components. The main characteristic of these advances has been the shrinking dimension of the features of which the ICs are made.

Original language	Undefined
Title of host publication	Developments in Surface Contamination and Cleaning - Methods for Removal of Particle Contaminants
Editors	Rajiv Kohli, Kashmiri L. Mittal
Place of Publication	Amsterdam
Publisher	Elsevier
Pages	81-120
Number of pages	40
ISBN (Print)	978-1-4377-7830-4
DOIs	https://doi.org/10.1016/B978-1-4377-7830-4.10003-9
Publication status	Published - 2010

Publication series

Name
Publisher	Elsevier

Keywords

METIS-270298
EWI-18802
SC-ICRY: Integrated Circuit Reliability and Yield
IR-74666

Access to Document

10.1016/B978-1-4377-7830-4.10003-9

http://eprints.eemcs.utwente.nl/secure2/18802/01/wali_boekdeel_Particles.pdf

Cite this

@inbook{92c35da55eaf46b89837d412e8d008ba,

title = "Particles in Semiconductor Processing",

abstract = "Advances in integrated circuits (ICs) have a high impact on society. These advances result in continuously increasing performance of home personal computers, higher density flash memory chips, faster wireless communication in combination with smaller antennas, and all kinds of combinations of the aforementioned components. The main characteristic of these advances has been the shrinking dimension of the features of which the ICs are made.",

keywords = "METIS-270298, EWI-18802, SC-ICRY: Integrated Circuit Reliability and Yield, IR-74666",

author = "Knotter, {D. Martin} and F. Wali",

note = "10.1016/B978-1-4377-7830-4.10003-9 ",

year = "2010",

doi = "10.1016/B978-1-4377-7830-4.10003-9",

language = "Undefined",

isbn = "978-1-4377-7830-4",

publisher = "Elsevier",

pages = "81--120",

editor = "Rajiv Kohli and Mittal, {Kashmiri L.}",

booktitle = "Developments in Surface Contamination and Cleaning - Methods for Removal of Particle Contaminants",

address = "Netherlands",

}

TY - CHAP

T1 - Particles in Semiconductor Processing

AU - Knotter, D. Martin

AU - Wali, F.

N1 - 10.1016/B978-1-4377-7830-4.10003-9

PY - 2010

Y1 - 2010

N2 - Advances in integrated circuits (ICs) have a high impact on society. These advances result in continuously increasing performance of home personal computers, higher density flash memory chips, faster wireless communication in combination with smaller antennas, and all kinds of combinations of the aforementioned components. The main characteristic of these advances has been the shrinking dimension of the features of which the ICs are made.

AB - Advances in integrated circuits (ICs) have a high impact on society. These advances result in continuously increasing performance of home personal computers, higher density flash memory chips, faster wireless communication in combination with smaller antennas, and all kinds of combinations of the aforementioned components. The main characteristic of these advances has been the shrinking dimension of the features of which the ICs are made.

KW - METIS-270298

KW - EWI-18802

KW - SC-ICRY: Integrated Circuit Reliability and Yield

KW - IR-74666

U2 - 10.1016/B978-1-4377-7830-4.10003-9

DO - 10.1016/B978-1-4377-7830-4.10003-9

M3 - Chapter

SN - 978-1-4377-7830-4

SP - 81

EP - 120

BT - Developments in Surface Contamination and Cleaning - Methods for Removal of Particle Contaminants

A2 - Kohli, Rajiv

A2 - Mittal, Kashmiri L.

PB - Elsevier

CY - Amsterdam

ER -