Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

J.Y. Cheng, F. Zhang, H.I. Smith, Gyula J. Vancso, C.A. Ross

Research output: Contribution to journalArticleAcademicpeer-review

60 Citations (Scopus)

Abstract

Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.
Original languageUndefined
Pages (from-to)597-601
Number of pages4
JournalAdvanced materials
Volume18
Issue number5
DOIs
Publication statusPublished - 2006

Keywords

  • METIS-230354
  • IR-72190
  • Block copolymers
  • Lithography
  • surface
  • Patterning
  • electron-beam
  • Template-directed assembly
  • Self-Assembly

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