Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

J.Y. Cheng; F. Zhang; H.I. Smith; Gyula J. Vancso; C.A. Ross

doi:10.1002/adma.200501936

Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

J.Y. Cheng, F. Zhang, H.I. Smith, Gyula J. Vancso, C.A. Ross

Research output: Contribution to journal › Article › Academic › peer-review

63 Citations (Scopus)

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Abstract

Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.

Original language	Undefined
Pages (from-to)	597-601
Number of pages	4
Journal	Advanced materials
Volume	18
Issue number	5
DOIs	https://doi.org/10.1002/adma.200501936
Publication status	Published - 2006

Keywords

METIS-230354
IR-72190
Block copolymers
Lithography
surface
Patterning
electron-beam
Template-directed assembly
Self-Assembly

Access to Document

10.1002/adma.200501936

Cite this

@article{7b726bee215d4fafa4815b4b44d79cd0,

title = "Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates",

abstract = "Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.",

keywords = "METIS-230354, IR-72190, Block copolymers, Lithography, surface, Patterning, electron-beam, Template-directed assembly, Self-Assembly",

author = "J.Y. Cheng and F. Zhang and H.I. Smith and Vancso, {Gyula J.} and C.A. Ross",

year = "2006",

doi = "10.1002/adma.200501936",

language = "Undefined",

volume = "18",

pages = "597--601",

journal = "Advanced materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "5",

}

TY - JOUR

T1 - Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

AU - Cheng, J.Y.

AU - Zhang, F.

AU - Smith, H.I.

AU - Vancso, Gyula J.

AU - Ross, C.A.

PY - 2006

Y1 - 2006

N2 - Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.

AB - Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.

KW - METIS-230354

KW - IR-72190

KW - Block copolymers

KW - Lithography

KW - surface

KW - Patterning

KW - electron-beam

KW - Template-directed assembly

KW - Self-Assembly

U2 - 10.1002/adma.200501936

DO - 10.1002/adma.200501936

M3 - Article

SN - 0935-9648

VL - 18

SP - 597

EP - 601

JO - Advanced materials

JF - Advanced materials

IS - 5

ER -