Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

P.A. Maury, M. Péter, V. Mahalingam, David Reinhoudt, Jurriaan Huskens

Research output: Contribution to journalArticleAcademicpeer-review

66 Citations (Scopus)

Abstract

Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.
Original languageUndefined
Pages (from-to)451-457
JournalAdvanced functional materials
Volume15
Issue number3
DOIs
Publication statusPublished - 2005

Keywords

  • IR-52995
  • METIS-225078
  • EC Grant Agreement nr.: FP6/500120

Cite this

@article{7d64c6dd52744528bea64e598079a9f5,
title = "Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication",
abstract = "Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.",
keywords = "IR-52995, METIS-225078, EC Grant Agreement nr.: FP6/500120",
author = "P.A. Maury and M. P{\'e}ter and V. Mahalingam and David Reinhoudt and Jurriaan Huskens",
year = "2005",
doi = "10.1002/adfm.200400284",
language = "Undefined",
volume = "15",
pages = "451--457",
journal = "Advanced functional materials",
issn = "1616-301X",
publisher = "Wiley-VCH Verlag",
number = "3",

}

Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication. / Maury, P.A.; Péter, M.; Mahalingam, V.; Reinhoudt, David; Huskens, Jurriaan.

In: Advanced functional materials, Vol. 15, No. 3, 2005, p. 451-457.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

AU - Maury, P.A.

AU - Péter, M.

AU - Mahalingam, V.

AU - Reinhoudt, David

AU - Huskens, Jurriaan

PY - 2005

Y1 - 2005

N2 - Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.

AB - Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.

KW - IR-52995

KW - METIS-225078

KW - EC Grant Agreement nr.: FP6/500120

U2 - 10.1002/adfm.200400284

DO - 10.1002/adfm.200400284

M3 - Article

VL - 15

SP - 451

EP - 457

JO - Advanced functional materials

JF - Advanced functional materials

SN - 1616-301X

IS - 3

ER -