Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

P.A. Maury, M. Péter, V. Mahalingam, David Reinhoudt, Jurriaan Huskens

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Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.
Original languageUndefined
Pages (from-to)451-457
JournalAdvanced functional materials
Issue number3
Publication statusPublished - 2005


  • IR-52995
  • METIS-225078
  • EC Grant Agreement nr.: FP6/500120

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