PELLICLE FOR EUV LITHOGRAPHY

A. Shavikof; Fred Bijkerk; Bart  Schurink; Jacobus Marinus Sturm; Robbert Wilhelmus Elisabeth van de Kruijs

PELLICLE FOR EUV LITHOGRAPHY

A. Shavikof (Inventor), Fred Bijkerk (Inventor), Bart Schurink (Inventor), Jacobus Marinus Sturm (Inventor), Robbert Wilhelmus Elisabeth van de Kruijs (Inventor)

Research output: Patent

Abstract

A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

Original language	English
Patent number	CN113646697
IPC	G03F 7/ 20 A I
Priority date	23/03/20
Publication status	Published - 12 Nov 2021

Cite this

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title = "PELLICLE FOR EUV LITHOGRAPHY",

abstract = "A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.",

author = "A. Shavikof and Fred Bijkerk and Bart Schurink and Sturm, {Jacobus Marinus} and {van de Kruijs}, {Robbert Wilhelmus Elisabeth}",

year = "2021",

month = nov,

day = "12",

language = "English",

type = "Patent",

note = "CN113646697; G03F 7/ 20 A I",

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TY - PAT

T1 - PELLICLE FOR EUV LITHOGRAPHY

AU - Shavikof, A.

AU - Bijkerk, Fred

AU - Schurink, Bart

AU - Sturm, Jacobus Marinus

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

PY - 2021/11/12

Y1 - 2021/11/12

N2 - A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

AB - A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

M3 - Patent

M1 - CN113646697

ER -

PELLICLE FOR EUV LITHOGRAPHY

Abstract

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