Pellicle for EUV lithograpy

Airat Shafikov; Fred Bijkerk; Bart Schurink; Marko Sturm; R.W.E. van de Kruijs

Pellicle for EUV lithograpy

Airat Shafikov (Inventor), Fred Bijkerk (Inventor), Bart Schurink (Inventor), Marko Sturm (Inventor), R.W.E. van de Kruijs (Inventor)

Research output: Patent

Abstract

A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

Original language	English
Patent number	NL2025186
IPC	G03F 7/ 20 A I
Priority date	12/04/19
Publication status	Published - 15 Oct 2020

Cite this

@misc{afda8ef67fc74b49b15af8f4e6d2e5c7,

title = "Pellicle for EUV lithograpy",

abstract = "A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.",

author = "Airat Shafikov and Fred Bijkerk and Bart Schurink and Marko Sturm and {van de Kruijs}, R.W.E.",

year = "2020",

month = oct,

day = "15",

language = "English",

type = "Patent",

note = "NL2025186; G03F 7/ 20 A I",

}

TY - PAT

T1 - Pellicle for EUV lithograpy

AU - Shafikov, Airat

AU - Bijkerk, Fred

AU - Schurink, Bart

AU - Sturm, Marko

AU - van de Kruijs, R.W.E.

PY - 2020/10/15

Y1 - 2020/10/15

N2 - A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

AB - A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

M3 - Patent

M1 - NL2025186

ER -

Pellicle for EUV lithograpy

Abstract

Fingerprint

Cite this