Pellicle for EUV lithograpy

Airat Shafikov (Inventor), Fred Bijkerk (Inventor), Bart Schurink (Inventor), Marko Sturm (Inventor), R.W.E. van de Kruijs (Inventor)

Research output: Patent


A method for making a pellicle for EUV lithography, the method comprising: depositing a sacrificial layer onto a substrate; etching away part of the substrate so as to expose a part of the sacrificial layer; depositing a core layer onto the sacrificial layer, the core layer forming a core part of a membrane of the pellicle once made; and etching away part of the sacrificial layer so as to expose a part of the core layer; wherein the core layer is deposited after the etching of the substrate.

Original languageEnglish
Patent numberNL2025186
IPCG03F 7/ 20 A I
Priority date12/04/19
Publication statusPublished - 15 Oct 2020


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