pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

Igor  Sîretanu; YuXi Guo; Bastian Timo Mei; Xiaowei Li; Hongwei Huang; Guido  Mul; Friedrich Gunther Mugele

pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

Igor Sîretanu, YuXi Guo, Bastian Timo Mei, Xiaowei Li, Hongwei Huang, Guido Mul, Friedrich Gunther Mugele

Research output: Contribution to conference › Poster › Academic

Abstract

Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like

Original language	English
Publication status	Published - 24 Sept 2018
Event	MESA+ meeting 2018 - Kinepolis, Enschede, Netherlands Duration: 24 Sept 2018 → 24 Sept 2018 https://www.utwente.nl/en/mesaplus/meeting/

Conference

Conference	MESA+ meeting 2018
Country/Territory	Netherlands
City	Enschede
Period	24/09/18 → 24/09/18
Other	(MESA+ Meeting/Dag)
Internet address	https://www.utwente.nl/en/mesaplus/meeting/

Cite this

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title = "pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles",

abstract = "Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like ",

author = "Igor S{\^i}retanu and YuXi Guo and Mei, {Bastian Timo} and Xiaowei Li and Hongwei Huang and Guido Mul and Mugele, {Friedrich Gunther}",

year = "2018",

month = sep,

day = "24",

language = "English",

note = "MESA+ meeting 2018 ; Conference date: 24-09-2018 Through 24-09-2018",

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TY - CONF

T1 - pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

AU - Sîretanu, Igor

AU - Guo, YuXi

AU - Mei, Bastian Timo

AU - Li, Xiaowei

AU - Huang, Hongwei

AU - Mul, Guido

AU - Mugele, Friedrich Gunther

PY - 2018/9/24

Y1 - 2018/9/24

N2 - Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like

AB - Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like

M3 - Poster

T2 - MESA+ meeting 2018

Y2 - 24 September 2018 through 24 September 2018

ER -

pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

Abstract

Conference

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