pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

Igor Sîretanu, YuXi Guo, Bastian Timo Mei, Xiaowei Li, Hongwei Huang, Guido Mul, Friedrich Gunther Mugele

Research output: Contribution to conferencePoster

Abstract

Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like
Original languageEnglish
Publication statusPublished - 24 Sep 2018
EventMESA+ meeting 2018 - Kinepolis, Enschede, Netherlands
Duration: 24 Sep 201824 Sep 2018
https://www.utwente.nl/en/mesaplus/meeting/

Conference

ConferenceMESA+ meeting 2018
CountryNetherlands
CityEnschede
Period24/09/1824/09/18
Other(MESA+ Meeting/Dag)
Internet address

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    Sîretanu, I., Guo, Y., Mei, B. T., Li, X., Huang, H., Mul, G., & Mugele, F. G. (2018). pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles. Poster session presented at MESA+ meeting 2018, Enschede, Netherlands.