pH-dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

Igor Sîretanu, YuXi Guo, Bastian Timo Mei, Xiaowei Li, Hongwei Huang, Guido Mul, Friedrich Gunther Mugele

Research output: Contribution to conferencePosterAcademic


Abstract: Facet-engineering and the deposition of co-catalysts lead to improvement in efficiency of semiconductors in photocatalytic applications. While facet-based charge separation is a known phenomenon and it is reported for a range of semiconductors, there is still a limited understanding of it and the mechanism behind remain elusive. Moreover, the proposed simplistic mechanism based on an offset of the valence band and conduction band of different facets is debated. Here, we show that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like bismuth-oxy-bromide (BiOBr) nanoparticles is strongly pH-dependent. High resolution atomic force microscopy and spectroscopy measurements demonstrate that the effect of pH is caused by a reversal of the surface charge of the 001 facets upon increasing the pH from 3 to 9 (isoelectric point 5), while the side facets remain (increasingly) negatively-charged. We propose a different mechanism and we suggest that differences in surface charge/band bending that vary for different surface orientations is the dominant element causing selective charge transport between different facets and metal-oxide deposition
Original languageEnglish
Publication statusPublished - 22 Oct 2018
EventLiquids@Interfaces 2018 - Bordeaux, France
Duration: 22 Oct 201825 Oct 2018


ConferenceLiquids@Interfaces 2018
Abbreviated titleLAI 2018
Internet address


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