Phosphorus-based compounds for EUV multilayer optics materials

V.V. Medvedev; A.E. Yakshin; R.W.E. van de Kruijs; F. Bijkerk

doi:10.1364/OME.5.001450

Phosphorus-based compounds for EUV multilayer optics materials

V.V. Medvedev^*
, A.E. Yakshin
, R.W.E. van de Kruijs
, F. Bijkerk

^*Corresponding author for this work

XUV Optics

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were considered for applications as reflector materials. Our calculations for multilayer structures with perfect interfaces show that the Pd/BP material combination suggests the highest reflectivity values, exceeding 70% within the 9.2 – 10.0 nm spectral range. We also discuss the potential of fabrication of BP-based multilayer structures for optical applications in the extreme ultraviolet range.

Original language	English
Pages (from-to)	1450-1459
Number of pages	10
Journal	Optical materials express
Volume	5
Issue number	6
Early online date	26 May 2015
DOIs	https://doi.org/10.1364/OME.5.001450
Publication status	Published - 1 Jun 2015

Keywords

METIS-310493
IR-95873
Multilayers
X-rays
soft x-rays
extreme ultraviolet (EUV)
Mirrors
Optical materials
Multilayer design

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title = "Phosphorus-based compounds for EUV multilayer optics materials",

abstract = "We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were considered for applications as reflector materials. Our calculations for multilayer structures with perfect interfaces show that the Pd/BP material combination suggests the highest reflectivity values, exceeding 70\% within the 9.2 – 10.0 nm spectral range. We also discuss the potential of fabrication of BP-based multilayer structures for optical applications in the extreme ultraviolet range.",

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AU - Yakshin, A.E.

AU - van de Kruijs, R.W.E.

AU - Bijkerk, F.

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AB - We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were considered for applications as reflector materials. Our calculations for multilayer structures with perfect interfaces show that the Pd/BP material combination suggests the highest reflectivity values, exceeding 70% within the 9.2 – 10.0 nm spectral range. We also discuss the potential of fabrication of BP-based multilayer structures for optical applications in the extreme ultraviolet range.

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KW - IR-95873

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KW - X-rays

KW - soft x-rays

KW - extreme ultraviolet (EUV)

KW - Mirrors

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KW - Multilayer design

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Phosphorus-based compounds for EUV multilayer optics materials

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Keywords

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