Photoluminescence-based detection of particle contamination on EUV reticle

An Gao, P.J. Rizo, L. Scaccabarozzi, C.J. Lee, V. Banine, F. Bijkerk

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 12 Aug 2012
EventSPIE Optical Engineering + Applications 2012 - San Diego, United States
Duration: 12 Aug 201216 Aug 2012

Conference

ConferenceSPIE Optical Engineering + Applications 2012
CountryUnited States
CitySan Diego
Period12/08/1216/08/12

Keywords

  • IR-83226
  • METIS-292768

Cite this

Gao, A., Rizo, P. J., Scaccabarozzi, L., Lee, C. J., Banine, V., & Bijkerk, F. (2012). Photoluminescence-based detection of particle contamination on EUV reticle. Abstract from SPIE Optical Engineering + Applications 2012, San Diego, United States.
Gao, An ; Rizo, P.J. ; Scaccabarozzi, L. ; Lee, C.J. ; Banine, V. ; Bijkerk, F. / Photoluminescence-based detection of particle contamination on EUV reticle. Abstract from SPIE Optical Engineering + Applications 2012, San Diego, United States.
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title = "Photoluminescence-based detection of particle contamination on EUV reticle",
keywords = "IR-83226, METIS-292768",
author = "An Gao and P.J. Rizo and L. Scaccabarozzi and C.J. Lee and V. Banine and F. Bijkerk",
year = "2012",
month = "8",
day = "12",
language = "English",
note = "SPIE Optical Engineering + Applications 2012 ; Conference date: 12-08-2012 Through 16-08-2012",

}

Gao, A, Rizo, PJ, Scaccabarozzi, L, Lee, CJ, Banine, V & Bijkerk, F 2012, 'Photoluminescence-based detection of particle contamination on EUV reticle' SPIE Optical Engineering + Applications 2012, San Diego, United States, 12/08/12 - 16/08/12, .

Photoluminescence-based detection of particle contamination on EUV reticle. / Gao, An; Rizo, P.J.; Scaccabarozzi, L.; Lee, C.J.; Banine, V.; Bijkerk, F.

2012. Abstract from SPIE Optical Engineering + Applications 2012, San Diego, United States.

Research output: Contribution to conferenceAbstract

TY - CONF

T1 - Photoluminescence-based detection of particle contamination on EUV reticle

AU - Gao, An

AU - Rizo, P.J.

AU - Scaccabarozzi, L.

AU - Lee, C.J.

AU - Banine, V.

AU - Bijkerk, F.

PY - 2012/8/12

Y1 - 2012/8/12

KW - IR-83226

KW - METIS-292768

M3 - Abstract

ER -

Gao A, Rizo PJ, Scaccabarozzi L, Lee CJ, Banine V, Bijkerk F. Photoluminescence-based detection of particle contamination on EUV reticle. 2012. Abstract from SPIE Optical Engineering + Applications 2012, San Diego, United States.