Photoluminescence-based detection of particle contamination on EUV reticle

An Gao, P.J. Rizo, L. Scaccabarozzi, C.J. Lee, V. Banine, F. Bijkerk

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 12 Aug 2012
EventSPIE Optical Engineering + Applications 2012 - San Diego, United States
Duration: 12 Aug 201216 Aug 2012

Conference

ConferenceSPIE Optical Engineering + Applications 2012
CountryUnited States
CitySan Diego
Period12/08/1216/08/12

Keywords

  • IR-83226
  • METIS-292768

Cite this

Gao, A., Rizo, P. J., Scaccabarozzi, L., Lee, C. J., Banine, V., & Bijkerk, F. (2012). Photoluminescence-based detection of particle contamination on EUV reticle. Abstract from SPIE Optical Engineering + Applications 2012, San Diego, United States.