Photoplastic SU-8 probes for Near-Field Optical Applications

J.P. Brugger, B.J. Kim, N.F. van Hulst

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Abstract

We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications
Original languageUndefined
Title of host publication2000 IEEE/LEOS International Conference on Optical MEMS.
Place of PublicationSheraton Kauai, Hawaii
PublisherIEEE
Pages135-136
Number of pages2
ISBN (Print)0-7803-6257-8
DOIs
Publication statusPublished - 21 Aug 2000
Event2000 IEEE/LEOS International Conference on Optical MEMS - Sheraton Kauai, Hawaii
Duration: 21 Aug 200024 Aug 2000

Publication series

Name
PublisherIEEE

Conference

Conference2000 IEEE/LEOS International Conference on Optical MEMS
Period21/08/0024/08/00
Other21-24 August, 2000

Keywords

  • IR-25384
  • METIS-130185

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