Photoplastic SU-8 probes for Near-Field Optical Applications

J.P. Brugger; B.J. Kim; N.F. van Hulst

doi:10.1109/OMEMS.2000.879662

Photoplastic SU-8 probes for Near-Field Optical Applications

J.P. Brugger, B.J. Kim, N.F. van Hulst

Optical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications

Original language	Undefined
Title of host publication	2000 IEEE/LEOS International Conference on Optical MEMS.
Place of Publication	Sheraton Kauai, Hawaii
Publisher	IEEE
Pages	135-136
Number of pages	2
ISBN (Print)	0-7803-6257-8
DOIs	https://doi.org/10.1109/OMEMS.2000.879662
Publication status	Published - 21 Aug 2000
Event	2000 IEEE/LEOS International Conference on Optical MEMS - Sheraton Kauai, Hawaii Duration: 21 Aug 2000 → 24 Aug 2000

Publication series

Name
Publisher	IEEE

Conference

Conference	2000 IEEE/LEOS International Conference on Optical MEMS
Period	21/08/00 → 24/08/00
Other	21-24 August, 2000

Keywords

IR-25384
METIS-130185

Access to Document

10.1109/OMEMS.2000.879662

00879662

Cite this

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title = "Photoplastic SU-8 probes for Near-Field Optical Applications",

abstract = "We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications",

keywords = "IR-25384, METIS-130185",

author = "J.P. Brugger and B.J. Kim and {van Hulst}, N.F.",

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doi = "10.1109/OMEMS.2000.879662",

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publisher = "IEEE",

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T1 - Photoplastic SU-8 probes for Near-Field Optical Applications

AU - Brugger, J.P.

AU - Kim, B.J.

AU - van Hulst, N.F.

PY - 2000/8/21

Y1 - 2000/8/21

N2 - We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications

AB - We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications

KW - IR-25384

KW - METIS-130185

U2 - 10.1109/OMEMS.2000.879662

DO - 10.1109/OMEMS.2000.879662

M3 - Conference contribution

SN - 0-7803-6257-8

SP - 135

EP - 136

BT - 2000 IEEE/LEOS International Conference on Optical MEMS.

PB - IEEE

CY - Sheraton Kauai, Hawaii

T2 - 2000 IEEE/LEOS International Conference on Optical MEMS

Y2 - 21 August 2000 through 24 August 2000

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