Physical properties of silicon oxide layers deposited at room temperature by a combination of ECR plasma and high-speed jet of silane

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, Hans Wallinga, P.H. Woerlee, C. Cobianu, M. Modreanu

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of Chemical Vapor Deposition XVI and EUROCVD 14
    PublisherThe Electrochemical Society Inc.
    Pages609-616
    Number of pages7
    ISBN (Print)1-56677-378-4
    Publication statusPublished - 1 Apr 2003

    Publication series

    Name
    Volume8

    Keywords

    • METIS-214284

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