Physical properties of silicon oxide layers deposited at room temperature by a combination of ECR plasma and high-speed jet of silane

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, Hans Wallinga, P.H. Woerlee, C. Cobianu, M. Modreanu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of Chemical Vapor Deposition XVI and EUROCVD 14
Publisher	Electrochemical Society
Pages	609-616
Number of pages	7
ISBN (Print)	1-56677-378-4
Publication status	Published - 1 Apr 2003

Name
Volume	8

Keywords

@inproceedings{4482675a7ece460daaeb3a84f456eb68,

title = "Physical properties of silicon oxide layers deposited at room temperature by a combination of ECR plasma and high-speed jet of silane",

keywords = "METIS-214284",

author = "I.G. Isai and Kovalgin, {Alexeij Y.} and J. Holleman and Hans Wallinga and P.H. Woerlee and C. Cobianu and M. Modreanu",

year = "2003",

month = apr,

day = "1",

language = "Undefined",

isbn = "1-56677-378-4",

publisher = "Electrochemical Society",

pages = "609--616",

booktitle = "Proceedings of Chemical Vapor Deposition XVI and EUROCVD 14",

address = "United States",

}

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Physical properties of silicon oxide layers deposited at room temperature by a combination of ECR plasma and high-speed jet of silane

AU - Isai, I.G.

AU - Kovalgin, Alexeij Y.

AU - Holleman, J.

AU - Wallinga, Hans

AU - Woerlee, P.H.

AU - Cobianu, C.

AU - Modreanu, M.

PY - 2003/4/1

Y1 - 2003/4/1

KW - METIS-214284

M3 - Conference contribution

SN - 1-56677-378-4

SP - 609

EP - 616

BT - Proceedings of Chemical Vapor Deposition XVI and EUROCVD 14

PB - Electrochemical Society

ER -