Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 2016
EventSPIE Advanced Lithography 2015 - Marriott and Convention Center, San Jose, United States
Duration: 22 Feb 201526 Feb 2015

Conference

ConferenceSPIE Advanced Lithography 2015
CountryUnited States
CitySan Jose
Period22/02/1526/02/15

Keywords

  • IR-98978

Cite this

Bayraktar, M., Chopra, A., Rijnders, A. J. H. M., Boller, K. J., & Bijkerk, F. (2016). Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts. Abstract from SPIE Advanced Lithography 2015, San Jose, United States.
@conference{9c7fef809a324f0da1041d0fcdbecf0a,
title = "Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts",
keywords = "IR-98978",
author = "Muharrem Bayraktar and A. Chopra and Rijnders, {Augustinus J.H.M.} and Boller, {Klaus J.} and Frederik Bijkerk",
year = "2016",
language = "English",
note = "SPIE Advanced Lithography 2015 ; Conference date: 22-02-2015 Through 26-02-2015",

}

Bayraktar, M, Chopra, A, Rijnders, AJHM, Boller, KJ & Bijkerk, F 2016, 'Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts' SPIE Advanced Lithography 2015, San Jose, United States, 22/02/15 - 26/02/15, .

Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts. / Bayraktar, Muharrem ; Chopra, A.; Rijnders, Augustinus J.H.M.; Boller, Klaus J.; Bijkerk, Frederik.

2016. Abstract from SPIE Advanced Lithography 2015, San Jose, United States.

Research output: Contribution to conferenceAbstract

TY - CONF

T1 - Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts

AU - Bayraktar, Muharrem

AU - Chopra, A.

AU - Rijnders, Augustinus J.H.M.

AU - Boller, Klaus J.

AU - Bijkerk, Frederik

PY - 2016

Y1 - 2016

KW - IR-98978

M3 - Abstract

ER -

Bayraktar M, Chopra A, Rijnders AJHM, Boller KJ, Bijkerk F. Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts. 2016. Abstract from SPIE Advanced Lithography 2015, San Jose, United States.