Plasma-charging damage of floating MIM capacitors

Zhichun Wang, Jan Ackaert, Cora Salm, F.G. Kuper, Marnix Tack, Eddy de Backer, Peter Coppens, Luc De Schepper, Basil Vlachakis

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    Abstract

    In this paper, the mechanism of plasma-charging damage (PCD) of metal-insulator-metal (MIM) capacitors as well as possible protection schemes are discussed. A range of test structures with different antennas simulating interconnect layout variations have been used to investigate the mechanism of PCD of MIM capacitors. Based on the experimental results, two models are presented, describing the relation between the damage and the ratio of the area of the exposed antennas connected to the MIM capacitors plates. New design rules are proposed in order to predict and automatically flag possible PCD sites. Furthermore, layout solutions to reduce PCD are suggested.
    Original languageUndefined
    Pages (from-to)1017-1024
    Number of pages8
    JournalIEEE Transactions on Electron Devices
    Volume51
    Issue number6
    DOIs
    Publication statusPublished - 1 Jun 2004

    Keywords

    • METIS-218014
    • IR-47482
    • metal–insulator–metal (MIM)
    • plasma-charging damage (PCD)
    • Antenna ratio (AR)
    • EWI-15527
    • metal–insulator–metal(MIM)

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