Plasma charging damage reduction in IC processing by a self-balancing interconnect

Z. Wang; J. Ackaert; C. Salm; F.G. Kuper; E. De Backer

doi:10.1016/j.microrel.2004.07.047

Plasma charging damage reduction in IC processing by a self-balancing interconnect

Z. Wang
, J. Ackaert
, C. Salm
, F.G. Kuper
, E. De Backer

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

A small TPC has been read out by means of a Medipix2 chip as direct anode. A Micromegas foil was placed Click to view the MathML source above the chip, and electron multiplication occurred in the gap. With a He/isobutane 80/20 mixture, gas multiplication factors up to tens of thousands were achieved, resulting in an efficiency for detecting single electrons of better than 90%. With this new readout technology for gas-filled detectors we recorded many image frames containing 2D images with tracks from cosmic muons. Along these tracks, electron clusters were observed, as well as ?-rays. With a gas layer thickness of only 1 mm, the device could be applied as vertex detector, outperforming all Si-based detectors.

Original language	English
Pages (from-to)	1503-1507
Number of pages	5
Journal	Microelectronics reliability
Volume	44
Issue number	9-11
DOIs	https://doi.org/10.1016/j.microrel.2004.07.047
Publication status	Published - 4 Oct 2004
Event	15th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, ESREF 2004 - Zurich, Switzerland Duration: 4 Oct 2004 → 8 Oct 2004 Conference number: 15

Keywords

EWI-15531
METIS-220200
Integrated circuits
Contact line
Circuit design
Complementary MOS technology
IR-67728

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10.1016/j.microrel.2004.07.047

Plasma Charging DamageAccepted author version, 127 KB

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title = "Plasma charging damage reduction in IC processing by a self-balancing interconnect",

abstract = "A small TPC has been read out by means of a Medipix2 chip as direct anode. A Micromegas foil was placed Click to view the MathML source above the chip, and electron multiplication occurred in the gap. With a He/isobutane 80/20 mixture, gas multiplication factors up to tens of thousands were achieved, resulting in an efficiency for detecting single electrons of better than 90\%. With this new readout technology for gas-filled detectors we recorded many image frames containing 2D images with tracks from cosmic muons. Along these tracks, electron clusters were observed, as well as ?-rays. With a gas layer thickness of only 1 mm, the device could be applied as vertex detector, outperforming all Si-based detectors.",

keywords = "EWI-15531, METIS-220200, Integrated circuits, Contact line, Circuit design, Complementary MOS technology, IR-67728",

author = "Z. Wang and J. Ackaert and C. Salm and F.G. Kuper and \{De Backer\}, E.",

year = "2004",

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doi = "10.1016/j.microrel.2004.07.047",

language = "English",

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journal = "Microelectronics reliability",

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AU - Wang, Z.

AU - Ackaert, J.

AU - Salm, C.

AU - Kuper, F.G.

AU - De Backer, E.

N1 - Conference code: 15

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KW - EWI-15531

KW - METIS-220200

KW - Integrated circuits

KW - Contact line

KW - Circuit design

KW - Complementary MOS technology

KW - IR-67728

U2 - 10.1016/j.microrel.2004.07.047

DO - 10.1016/j.microrel.2004.07.047

M3 - Article

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T2 - 15th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, ESREF 2004

Y2 - 4 October 2004 through 8 October 2004

ER -

Plasma charging damage reduction in IC processing by a self-balancing interconnect

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Keywords

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