Plasma-Induced Charging Damage of Gate Oxides

Zhichun Wang, P.G. Tanner, Cora Salm, A.J. Mouthaan, F.G. Kuper, M. Andriesse, E. van der Drift

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationSAFE'99
    Place of PublicationMierlo, The Netherlands
    Pages593-600
    Number of pages8
    Publication statusPublished - 24 Nov 1999

    Keywords

    • METIS-113913

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