Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

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Abstract

We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.
Original languageEnglish
Number of pages1
Publication statusPublished - 11 Mar 2014
Event26th NNV-Symposium Plasma Physics & Radiation Technology 2014 - CongresHotel De Werelt, Lunteren, Netherlands
Duration: 11 Mar 201412 Mar 2014
Conference number: 26

Conference

Conference26th NNV-Symposium Plasma Physics & Radiation Technology 2014
CountryNetherlands
CityLunteren
Period11/03/1412/03/14

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pulsed laser deposition
oxide films
stoichiometry
laser induced fluorescence
oxidation
plumes
spectroscopy
gas pressure
oxides
oxygen
thin films
diffraction
x rays

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Groenen, R., Orsel, K., Bastiaens, H. M. J., Boller, K. J., Koster, G., & Rijnders, A. J. H. M. (2014). Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films. Poster session presented at 26th NNV-Symposium Plasma Physics & Radiation Technology 2014, Lunteren, Netherlands.
Groenen, R. ; Orsel, K. ; Bastiaens, H.M.J. ; Boller, Klaus J. ; Koster, G. ; Rijnders, A.J.H.M. / Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films. Poster session presented at 26th NNV-Symposium Plasma Physics & Radiation Technology 2014, Lunteren, Netherlands.1 p.
@conference{78625778d25d4e1b8291218de5147d65,
title = "Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films",
abstract = "We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.",
author = "R. Groenen and K. Orsel and H.M.J. Bastiaens and Boller, {Klaus J.} and G. Koster and A.J.H.M. Rijnders",
year = "2014",
month = "3",
day = "11",
language = "English",
note = "26th NNV-Symposium Plasma Physics & Radiation Technology 2014 ; Conference date: 11-03-2014 Through 12-03-2014",

}

Groenen, R, Orsel, K, Bastiaens, HMJ, Boller, KJ, Koster, G & Rijnders, AJHM 2014, 'Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films' 26th NNV-Symposium Plasma Physics & Radiation Technology 2014, Lunteren, Netherlands, 11/03/14 - 12/03/14, .

Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films. / Groenen, R.; Orsel, K.; Bastiaens, H.M.J.; Boller, Klaus J.; Koster, G.; Rijnders, A.J.H.M.

2014. Poster session presented at 26th NNV-Symposium Plasma Physics & Radiation Technology 2014, Lunteren, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

AU - Groenen, R.

AU - Orsel, K.

AU - Bastiaens, H.M.J.

AU - Boller, Klaus J.

AU - Koster, G.

AU - Rijnders, A.J.H.M.

PY - 2014/3/11

Y1 - 2014/3/11

N2 - We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.

AB - We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.

M3 - Poster

ER -

Groenen R, Orsel K, Bastiaens HMJ, Boller KJ, Koster G, Rijnders AJHM. Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films. 2014. Poster session presented at 26th NNV-Symposium Plasma Physics & Radiation Technology 2014, Lunteren, Netherlands.