Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

R. Groenen; K. Orsel; H.M.J. Bastiaens; Klaus J. Boller; G. Koster; A.J.H.M. Rijnders

Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

R. Groenen, K. Orsel, H.M.J. Bastiaens, Klaus J. Boller, G. Koster, A.J.H.M. Rijnders

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Abstract

We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.

Original language	English
Number of pages	1
Publication status	Published - 11 Mar 2014
Event	26th NNV-Symposium Plasma Physics & Radiation Technology 2014 - CongresHotel De Werelt, Lunteren, Netherlands Duration: 11 Mar 2014 → 12 Mar 2014 Conference number: 26

Conference

Conference	26th NNV-Symposium Plasma Physics & Radiation Technology 2014
Country/Territory	Netherlands
City	Lunteren
Period	11/03/14 → 12/03/14

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@conference{78625778d25d4e1b8291218de5147d65,

title = "Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films",

abstract = "We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.",

author = "R. Groenen and K. Orsel and H.M.J. Bastiaens and Boller, {Klaus J.} and G. Koster and A.J.H.M. Rijnders",

year = "2014",

month = mar,

day = "11",

language = "English",

note = "26th NNV-Symposium Plasma Physics & Radiation Technology 2014 ; Conference date: 11-03-2014 Through 12-03-2014",

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TY - CONF

T1 - Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

AU - Groenen, R.

AU - Orsel, K.

AU - Bastiaens, H.M.J.

AU - Boller, Klaus J.

AU - Koster, G.

AU - Rijnders, A.J.H.M.

N1 - Conference code: 26

PY - 2014/3/11

Y1 - 2014/3/11

N2 - We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.

AB - We present a unique overview on the influence of growth parameters on the characteristics of the PLD plasma plume using Optical Self-Emission (OSE) imaging and spectroscopy, supported with Laser Induced Fluorescence (LIF) measurements. It is shown that in a relatively small background gas pressure regime, from 10-2 mbar to 10-1 mbar oxygen pressure, a transition from nonstoichiometric to stoichiometric growth of SrTiO3 films occurs as measured with X-ray Diffraction (XRD). In this pressure regime, OSE spectroscopy and LIF measurements also show a transition from incomplete to full oxidation of species in the plasma plume. This suggests that the oxidation of species in the plasma is a crucial mechanism for the stoichiometric reconstruction of the synthesized oxide thin films.

M3 - Poster

T2 - 26th NNV-Symposium Plasma Physics & Radiation Technology 2014

Y2 - 11 March 2014 through 12 March 2014

ER -

Plasma oxidation as key mechanism for stoichiometry in Pulsed Laser Deposition grown oxide films

Abstract

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