Plasma polymerization of thiophene derivatives

L.M.H. Groenewoud, G.H.M. Engbers, Jan Feijen

Research output: Contribution to journalArticleAcademicpeer-review

34 Citations (Scopus)

Abstract

To obtain plasma polymerized (PP) layers with a high retention of the conjugated monomer structure, fragmentation during deposition should be minimized. Different methylated and halogenated thiophenes were used as monomers in plasma polymerization, and the influence of the substituent(s) on fragmentation during deposition was investigated. With the use of optical emission spectroscopy (OES) and mass spectroscopy (MS), it was found that methylated thiophenes show a low degree of fragmentation during deposition, whereas for halogenated thiophenes a high degree of fragmentation was observed. For a specific substituent, fragmentation was less for thiophene derivatives with substitution on the 2-position than on the 3-position. Disubstituted thiophenes always showed less fragmentation than their monosubstituted analogues. Due to the lower degree of fragmentation, PP layers from methylated thiophenes contained a higher amount of conjugated structures. Consequently, a higher conductivity was measured for these PP layers after iodine doping.
Original languageEnglish
Pages (from-to)1368-1374
JournalLangmuir
Volume19
Issue number4
DOIs
Publication statusPublished - 2003

Fingerprint

Plasma polymerization
Thiophenes
Thiophene
thiophenes
fragmentation
polymerization
Derivatives
plasma layers
Plasmas
Monomers
monomers
Optical emission spectroscopy
Iodine
optical emission spectroscopy
Substitution reactions
iodine
Doping (additives)
Spectroscopy
mass spectroscopy
substitutes

Keywords

  • METIS-217004
  • IR-59266

Cite this

Groenewoud, L. M. H., Engbers, G. H. M., & Feijen, J. (2003). Plasma polymerization of thiophene derivatives. Langmuir, 19(4), 1368-1374. https://doi.org/10.1021/la020292c
Groenewoud, L.M.H. ; Engbers, G.H.M. ; Feijen, Jan. / Plasma polymerization of thiophene derivatives. In: Langmuir. 2003 ; Vol. 19, No. 4. pp. 1368-1374.
@article{5e6a0e57fa3c464e86edd666141f0d23,
title = "Plasma polymerization of thiophene derivatives",
abstract = "To obtain plasma polymerized (PP) layers with a high retention of the conjugated monomer structure, fragmentation during deposition should be minimized. Different methylated and halogenated thiophenes were used as monomers in plasma polymerization, and the influence of the substituent(s) on fragmentation during deposition was investigated. With the use of optical emission spectroscopy (OES) and mass spectroscopy (MS), it was found that methylated thiophenes show a low degree of fragmentation during deposition, whereas for halogenated thiophenes a high degree of fragmentation was observed. For a specific substituent, fragmentation was less for thiophene derivatives with substitution on the 2-position than on the 3-position. Disubstituted thiophenes always showed less fragmentation than their monosubstituted analogues. Due to the lower degree of fragmentation, PP layers from methylated thiophenes contained a higher amount of conjugated structures. Consequently, a higher conductivity was measured for these PP layers after iodine doping.",
keywords = "METIS-217004, IR-59266",
author = "L.M.H. Groenewoud and G.H.M. Engbers and Jan Feijen",
year = "2003",
doi = "10.1021/la020292c",
language = "English",
volume = "19",
pages = "1368--1374",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "4",

}

Groenewoud, LMH, Engbers, GHM & Feijen, J 2003, 'Plasma polymerization of thiophene derivatives' Langmuir, vol. 19, no. 4, pp. 1368-1374. https://doi.org/10.1021/la020292c

Plasma polymerization of thiophene derivatives. / Groenewoud, L.M.H.; Engbers, G.H.M.; Feijen, Jan.

In: Langmuir, Vol. 19, No. 4, 2003, p. 1368-1374.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Plasma polymerization of thiophene derivatives

AU - Groenewoud, L.M.H.

AU - Engbers, G.H.M.

AU - Feijen, Jan

PY - 2003

Y1 - 2003

N2 - To obtain plasma polymerized (PP) layers with a high retention of the conjugated monomer structure, fragmentation during deposition should be minimized. Different methylated and halogenated thiophenes were used as monomers in plasma polymerization, and the influence of the substituent(s) on fragmentation during deposition was investigated. With the use of optical emission spectroscopy (OES) and mass spectroscopy (MS), it was found that methylated thiophenes show a low degree of fragmentation during deposition, whereas for halogenated thiophenes a high degree of fragmentation was observed. For a specific substituent, fragmentation was less for thiophene derivatives with substitution on the 2-position than on the 3-position. Disubstituted thiophenes always showed less fragmentation than their monosubstituted analogues. Due to the lower degree of fragmentation, PP layers from methylated thiophenes contained a higher amount of conjugated structures. Consequently, a higher conductivity was measured for these PP layers after iodine doping.

AB - To obtain plasma polymerized (PP) layers with a high retention of the conjugated monomer structure, fragmentation during deposition should be minimized. Different methylated and halogenated thiophenes were used as monomers in plasma polymerization, and the influence of the substituent(s) on fragmentation during deposition was investigated. With the use of optical emission spectroscopy (OES) and mass spectroscopy (MS), it was found that methylated thiophenes show a low degree of fragmentation during deposition, whereas for halogenated thiophenes a high degree of fragmentation was observed. For a specific substituent, fragmentation was less for thiophene derivatives with substitution on the 2-position than on the 3-position. Disubstituted thiophenes always showed less fragmentation than their monosubstituted analogues. Due to the lower degree of fragmentation, PP layers from methylated thiophenes contained a higher amount of conjugated structures. Consequently, a higher conductivity was measured for these PP layers after iodine doping.

KW - METIS-217004

KW - IR-59266

U2 - 10.1021/la020292c

DO - 10.1021/la020292c

M3 - Article

VL - 19

SP - 1368

EP - 1374

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 4

ER -