Poly(ferrocenylsilanes) as Etch Barriers in Nano and Microlithographic Applications

Research output: Chapter in Book/Report/Conference proceedingChapterAcademic

15 Citations (Scopus)

Abstract

Thin films of organic-organometallic block copolymers are shown to be efficient self-assembled templates for nanolithography. Block copolymers composed of organic blocks such as polyisoprene or polystyrene and a poly(ferrocenylsilane) block microphase separate to form a monolayer of densely packed organometallic spheres in an organic matrix. The high resistance of the organometallic phase to reactive ion etching enables the nanoscale patterns to be transferred into silicon substrates, forming nano structured surfaces. Electrostatic self-assembly of poly(ferrocenylsilane) polyanions and polycations is discussed as a means to form laterally structured organometallic multilayer thin films by area-selective adsorption onto chemically patterned substrates.
Original languageUndefined
Title of host publicationMetal- and Metalloid-Containing Macromolecules
EditorsA.S. Abd-El-Aziz
PublisherInternational Union of Pure and Applied Chemistry
Pages45-56
Number of pages11
ISBN (Print)3527307001
DOIs
Publication statusPublished - 2003

Publication series

NameMacromol. Symp.
PublisherInternational Union of Pure and Applied Chemistry
Number196
Volume196
ISSN (Print)1022-1360

Keywords

  • METIS-213183
  • reactive ion etching
  • Organometallic polymers
  • polyelectrolytes
  • Nanolithography
  • Block copolymers
  • IR-71931

Cite this

Hempenius, M. A., Lammertink, R. G. H., Péter, M., & Vancso, G. J. (2003). Poly(ferrocenylsilanes) as Etch Barriers in Nano and Microlithographic Applications. In A. S. Abd-El-Aziz (Ed.), Metal- and Metalloid-Containing Macromolecules (pp. 45-56). (Macromol. Symp.; Vol. 196, No. 196). International Union of Pure and Applied Chemistry. https://doi.org/10.1002/masy.200390175