Abstract
A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
Original language | Undefined |
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Patent number | US20030397359 |
Priority date | 2/08/05 |
Publication status | Submitted - 27 Mar 2003 |
Keywords
- IR-76060
- EWI-20133
- METIS-229588
- EWI-19677