@article{84abb566ff1f4daca744fda1bd27c27f,
title = "Post deposition nitridation of Si in W/Si soft x-ray multilayer systems",
abstract = "Partial nitridation of W/Si multilayer systems with a 2.5 nm period was investigated in an attempt to reduce optically unfavorable tungsten silicide formation in the systems. Nitridation was applied directly after the deposition of every Si layer by exposing the Si surfaces to reactive nitrogen species from an ion source. As a result the formation of substantially sharper interfaces and a reduction in the silicide formation were observed in the systems. However, the passivation treatment caused a pronounced reduction in the X-ray reflectivity at 0.84 nm wavelength because of deep nitrogen penetration in the Si layers. This reduced the optical contrast between the reflector and spacer layer, which compensated the effect of the improved interface profile.",
keywords = "UT-Hybrid-D, 0.84 nm, 2.5 nm, 22/1 OA procedure",
author = "Roman Medvedev and C.P. Hendrikx and J.M. Sturm and Yakunin, {Sergey N.} and Makhotkin, {Igor A.} and Andrey Yakshin and F. Bijkerk",
note = "Elsevier deal Funding Information: This work has been carried out in the frame of the Industrial Partnership Program {\textquoteleft}X-tools{\textquoteright}, project number 741.018.301, funded by the Netherlands Organization for Scientific Research, ASML, Carl Zeiss SMT, and Malvern Panalytical. We acknowledge the support of the Industrial Focus Group XUV Optics at the MESA+ Institute for Nanotechnology at the University of Twente. The Physikalisch-Technische Bundesanstalt (PTB) EUV-radiometry group is acknowledged for doing the reflectivity measurements. S.N. Yakunin acknowledges the funding of Russian Foundation for Basic Research (RFBR), project number 19-29-12038. Funding Information: This work has been carried out in the frame of the Industrial Partnership Program ?X-tools?, project number 741.018.301, funded by the Netherlands Organization for Scientific Research, ASML, Carl Zeiss SMT, and Malvern Panalytical. We acknowledge the support of the Industrial Focus Group XUV Optics at the MESA+ Institute for Nanotechnology at the University of Twente. The Physikalisch-Technische Bundesanstalt (PTB) EUV-radiometry group is acknowledged for doing the reflectivity measurements. S.N. Yakunin acknowledges the funding of Russian Foundation for Basic Research (RFBR), project number 19-29-12038. Publisher Copyright: {\textcopyright} 2021",
year = "2021",
month = may,
day = "1",
doi = "10.1016/j.tsf.2021.138601",
language = "English",
volume = "725",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier B.V.",
}