Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon

Hai Le-The*, Roald M. Tiggelaar, Erwin Berenschot, Albert Van Den Berg, Niels Tas, Jan C.T. Eijkel

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)
46 Downloads (Pure)

Abstract

We found that continuous films of gold (Au) on oxidized silicon (SiO2) substrates, upon treatment with ultraviolet (UV)-ozone, exhibit strong adhesion to the SiO2 support. Importantly, the enhancement is independent of micro- or nanostructuring of such nanometer-thick films. Deposition of a second Au layer on top of the pretreated Au layer makes the adhesion stable for at least 5 months in environmental air. Using this treatment method enables us to large-scale fabricate various SiO2-supported Au structures at various thicknesses with dimensions spanning from a few hundreds of nanometers to a few micrometers, without the use of additional adhesion layers. We explain the observed adhesion improvement as polarization-induced increased strength of Auδ-Siδ+ bonds at the Au-SiO2 interface due to the formation of a gold oxide monolayer on the Au surface by the UV-ozone treatment. Our simple and enabling method thus provides opportunities for patterning Au micro/nanostructures on SiO2 substrates without an intermediate metallic adhesion layer, which is critical for biosensing and nanophotonic applications.

Original languageEnglish
Pages (from-to)6782-6789
Number of pages8
JournalACS nano
Volume13
DOIs
Publication statusPublished - 12 Jun 2019

Keywords

  • adhesion enhancement
  • gold oxide
  • gold thin films
  • oxidized silicon substrates
  • UV-ozone treatment

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