Preparation of a dual sputtering PD-Cu alloy film and its application in hydrogen separation

D.H. Tong; H.T.H. Hoang Thi Hanh; F.C. Gielens; Henricus V. Jansen; Michael Curt Elwenspoek

Preparation of a dual sputtering PD-Cu alloy film and its application in hydrogen separation

D.H. Tong, H.T.H. Hoang Thi Hanh, F.C. Gielens, Henricus V. Jansen, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

Sub-micron thick Pd-Cu alloy films have been deposited by a dual sputtering, which allows a high morphology and phase structure of the sputtered layers were investigated by energy dispersive spectrometer (EDS), E-ray photoelectron spectroscopy (XPS), scanning electron microscope (ESM), transmission electron microscope (TEM) and X-ray diffraction (XRD), respectively. The resulgs proved that the Pd-Cu layers were the ally of pure Pd and pure Cu. The characterized Pd-Cu ally layers were deposited on a hydrogen separation. High fluxes of up to 1.6 mol H2/m2.s have been measured through a750 nm Pd-Cu at 723 K with the minimal selectivity of about 500 for H2 over He.

Original language	Undefined
Title of host publication	14th MicroMechanics Europe Workshop, MME 2003
Place of Publication	Delft
Publisher	MicroMechanics Europe
Pages	1-4
Number of pages	4
ISBN (Print)	9080826618
Publication status	Published - 2 Nov 2003
Event	14th MicroMechanics Europe Workshop, MME 2003 - Delft, Netherlands Duration: 2 Nov 2003 → 4 Nov 2003 Conference number: 14

Publication series

Name
Publisher	Eburon

Conference

Conference	14th MicroMechanics Europe Workshop, MME 2003
Abbreviated title	MME
Country/Territory	Netherlands
City	Delft
Period	2/11/03 → 4/11/03

Keywords

METIS-214515
EWI-19725
IR-46301

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Cite this

@inproceedings{af00433312e74e9f827472a43fdf00f1,

title = "Preparation of a dual sputtering PD-Cu alloy film and its application in hydrogen separation",

abstract = "Sub-micron thick Pd-Cu alloy films have been deposited by a dual sputtering, which allows a high morphology and phase structure of the sputtered layers were investigated by energy dispersive spectrometer (EDS), E-ray photoelectron spectroscopy (XPS), scanning electron microscope (ESM), transmission electron microscope (TEM) and X-ray diffraction (XRD), respectively. The resulgs proved that the Pd-Cu layers were the ally of pure Pd and pure Cu. The characterized Pd-Cu ally layers were deposited on a hydrogen separation. High fluxes of up to 1.6 mol H2/m2.s have been measured through a750 nm Pd-Cu at 723 K with the minimal selectivity of about 500 for H2 over He.",

keywords = "METIS-214515, EWI-19725, IR-46301",

author = "D.H. Tong and {Hoang Thi Hanh}, H.T.H. and F.C. Gielens and Jansen, {Henricus V.} and Elwenspoek, {Michael Curt}",

year = "2003",

month = nov,

day = "2",

language = "Undefined",

isbn = "9080826618",

publisher = "MicroMechanics Europe",

pages = "1--4",

booktitle = "14th MicroMechanics Europe Workshop, MME 2003",

note = "14th MicroMechanics Europe Workshop, MME 2003 ; Conference date: 02-11-2003 Through 04-11-2003",

}

TY - GEN

T1 - Preparation of a dual sputtering PD-Cu alloy film and its application in hydrogen separation

AU - Tong, D.H.

AU - Hoang Thi Hanh, H.T.H.

AU - Gielens, F.C.

AU - Jansen, Henricus V.

AU - Elwenspoek, Michael Curt

N1 - Conference code: 14

PY - 2003/11/2

Y1 - 2003/11/2

N2 - Sub-micron thick Pd-Cu alloy films have been deposited by a dual sputtering, which allows a high morphology and phase structure of the sputtered layers were investigated by energy dispersive spectrometer (EDS), E-ray photoelectron spectroscopy (XPS), scanning electron microscope (ESM), transmission electron microscope (TEM) and X-ray diffraction (XRD), respectively. The resulgs proved that the Pd-Cu layers were the ally of pure Pd and pure Cu. The characterized Pd-Cu ally layers were deposited on a hydrogen separation. High fluxes of up to 1.6 mol H2/m2.s have been measured through a750 nm Pd-Cu at 723 K with the minimal selectivity of about 500 for H2 over He.

AB - Sub-micron thick Pd-Cu alloy films have been deposited by a dual sputtering, which allows a high morphology and phase structure of the sputtered layers were investigated by energy dispersive spectrometer (EDS), E-ray photoelectron spectroscopy (XPS), scanning electron microscope (ESM), transmission electron microscope (TEM) and X-ray diffraction (XRD), respectively. The resulgs proved that the Pd-Cu layers were the ally of pure Pd and pure Cu. The characterized Pd-Cu ally layers were deposited on a hydrogen separation. High fluxes of up to 1.6 mol H2/m2.s have been measured through a750 nm Pd-Cu at 723 K with the minimal selectivity of about 500 for H2 over He.

KW - METIS-214515

KW - EWI-19725

KW - IR-46301

M3 - Conference contribution

SN - 9080826618

SP - 1

EP - 4

BT - 14th MicroMechanics Europe Workshop, MME 2003

PB - MicroMechanics Europe

CY - Delft

T2 - 14th MicroMechanics Europe Workshop, MME 2003

Y2 - 2 November 2003 through 4 November 2003

ER -