Progress in EUV optics lifetime expectations

Bas Mertens*, Markus Weiss, Hans Meiling, Roman Klein, Eric Louis, Ralph Kurt, Marco Wedowski, Hans Trenkler, Bas Wolschrijn, Rik Jansen, Annemieke Van De Runstraat, Roel Moors, Karel Spee, Sven Plöger, Robbert Van De Kruijs

*Corresponding author for this work

Research output: Contribution to journalConference articleAcademicpeer-review

41 Citations (Scopus)

Abstract

Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.

Original languageEnglish
Pages (from-to)16-22
Number of pages7
JournalMicroelectronic engineering
Volume73-74
DOIs
Publication statusPublished - 1 Jan 2004
Externally publishedYes
EventMicro and Nano Engineering, MNE 2003 - Cambridge, United Kingdom
Duration: 22 Sep 200325 Sep 2003

Keywords

  • Cap layers
  • Carbon growth
  • EUV lithography
  • Optics lifetime
  • Oxidation

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