Progress in EUV optics lifetime expectations

Bas Mertens; Markus Weiss; Hans Meiling; Roman Klein; Eric Louis; Ralph Kurt; Marco Wedowski; Hans Trenkler; Bas Wolschrijn; Rik Jansen; Annemieke Van De Runstraat; Roel Moors; Karel Spee; Sven Plöger; Robbert Van De Kruijs

doi:10.1016/S0167-9317(04)00066-8

Progress in EUV optics lifetime expectations

Bas Mertens^*, Markus Weiss, Hans Meiling, Roman Klein, Eric Louis, Ralph Kurt, Marco Wedowski, Hans Trenkler, Bas Wolschrijn, Rik Jansen, Annemieke Van De Runstraat, Roel Moors, Karel Spee, Sven Plöger, Robbert Van De Kruijs

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › Academic › peer-review

41 Citations (Scopus)

Abstract

Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.

Original language	English
Pages (from-to)	16-22
Number of pages	7
Journal	Microelectronic engineering
Volume	73-74
DOIs	https://doi.org/10.1016/S0167-9317(04)00066-8
Publication status	Published - 1 Jan 2004
Externally published	Yes
Event	Micro and Nano Engineering, MNE 2003 - Cambridge, United Kingdom Duration: 22 Sep 2003 → 25 Sep 2003

Keywords

Cap layers
Carbon growth
EUV lithography
Optics lifetime
Oxidation

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10.1016/S0167-9317(04)00066-8

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title = "Progress in EUV optics lifetime expectations",

abstract = "Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.",

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author = "Bas Mertens and Markus Weiss and Hans Meiling and Roman Klein and Eric Louis and Ralph Kurt and Marco Wedowski and Hans Trenkler and Bas Wolschrijn and Rik Jansen and {Van De Runstraat}, Annemieke and Roel Moors and Karel Spee and Sven Pl{\"o}ger and {Van De Kruijs}, Robbert",

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Progress in EUV optics lifetime expectations. / Mertens, Bas; Weiss, Markus; Meiling, Hans; Klein, Roman; Louis, Eric; Kurt, Ralph; Wedowski, Marco; Trenkler, Hans; Wolschrijn, Bas; Jansen, Rik; Van De Runstraat, Annemieke; Moors, Roel; Spee, Karel; Plöger, Sven; Van De Kruijs, Robbert.

In: Microelectronic engineering, Vol. 73-74, 01.01.2004, p. 16-22.

Research output: Contribution to journal › Conference article › Academic › peer-review

TY - JOUR

T1 - Progress in EUV optics lifetime expectations

AU - Mertens, Bas

AU - Weiss, Markus

AU - Meiling, Hans

AU - Klein, Roman

AU - Louis, Eric

AU - Kurt, Ralph

AU - Wedowski, Marco

AU - Trenkler, Hans

AU - Wolschrijn, Bas

AU - Jansen, Rik

AU - Van De Runstraat, Annemieke

AU - Moors, Roel

AU - Spee, Karel

AU - Plöger, Sven

AU - Van De Kruijs, Robbert

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AB - Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.

KW - Cap layers

KW - Carbon growth

KW - EUV lithography

KW - Optics lifetime

KW - Oxidation

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