TY - JOUR
T1 - Progress in EUV optics lifetime expectations
AU - Mertens, Bas
AU - Weiss, Markus
AU - Meiling, Hans
AU - Klein, Roman
AU - Louis, Eric
AU - Kurt, Ralph
AU - Wedowski, Marco
AU - Trenkler, Hans
AU - Wolschrijn, Bas
AU - Jansen, Rik
AU - Van De Runstraat, Annemieke
AU - Moors, Roel
AU - Spee, Karel
AU - Plöger, Sven
AU - Van De Kruijs, Robbert
PY - 2004/1/1
Y1 - 2004/1/1
N2 - Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.
AB - Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach.
KW - Cap layers
KW - Carbon growth
KW - EUV lithography
KW - Optics lifetime
KW - Oxidation
UR - http://www.scopus.com/inward/record.url?scp=18544398501&partnerID=8YFLogxK
U2 - 10.1016/S0167-9317(04)00066-8
DO - 10.1016/S0167-9317(04)00066-8
M3 - Conference article
AN - SCOPUS:18544398501
VL - 73-74
SP - 16
EP - 22
JO - Microelectronic engineering
JF - Microelectronic engineering
SN - 0167-9317
T2 - Micro and Nano Engineering, MNE 2003
Y2 - 22 September 2003 through 25 September 2003
ER -