Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Francesco Torretti, John Sheil, Ruben Schupp, M M Basko, Muharrem Bayraktar, Randy Meijer, Stefan Witte, Wim Ubachs, Ronnie Hoekstra, Oscar Versolato*, Amanda Neukirch, James Colgan*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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