Properties of annealed silicon oxynitride layers for optical applications

Kerstin Worhoff, M.G. Hussein, C.G.H. Roeloffzen, L.T.H. Hilderink

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageEnglish
    Title of host publicationSilicon nitride and silicon dioxide thin insulating films VII
    Subtitle of host publicationproceedings of the international symposium
    EditorsR.E. Sah, K.B. Sundaram, M.J. Deen, D. Landeer, W.D. Brown, D Misra
    PublisherThe Electrochemical Society Inc.
    Pages406-417
    Number of pages12
    ISBN (Print)1-56677-347-4
    Publication statusPublished - 27 Apr 2003
    Event7th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2003 - Paris, France
    Duration: 27 Apr 20032 May 2003
    Conference number: 7

    Publication series

    NameProceedings
    PublisherElectrochemical Society
    Volume2003-02

    Conference

    Conference7th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2003
    CountryFrance
    CityParis
    Period27/04/032/05/03

    Keywords

    • METIS-214847

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