Properties of obliquely sputtered Co on different underlayers on polymer substrate

L.T. Nguyen, J.C. Lodder

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    Co films have been obliquely sputtered on different underlayers (Cr and Cu) onto polymer substrate. The thickness of Co and the underlayer were kept at 20nm and 180 nm, respectively. Microstructural and magnetic properties of these films have been analysed. In all films, the in plane anisotropy is confined in the direction perpendicular to the incident plane (transverse direction). However, the different microstructure of underlayers strongly affected properties of the magnetic layer. The Hc in the transverse direction are 180 and 80 kA/m for Cr and Cu, respectively.
    Original languageUndefined
    Pages (from-to)2171-2172
    Number of pages2
    JournalJournal of magnetism and magnetic materials
    Issue number272-276
    Publication statusPublished - 2004


    • Magnetic anisotropy
    • Underlayer
    • Polymer substrate
    • Thin film
    • IR-63019
    • EWI-5604
    • SMI-TST: From 2006 in EWI-TST
    • METIS-218491
    • Oblique deposition

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