Properties of obliquely sputtered Co on different underlayers on polymer substrate

L.T. Nguyen; J.C. Lodder

doi:10.1016/j.jmmm.2003.12.524

Properties of obliquely sputtered Co on different underlayers on polymer substrate

L.T. Nguyen, J.C. Lodder

Research output: Contribution to journal › Article › Academic › peer-review

3 Citations (Scopus)

Abstract

Co films have been obliquely sputtered on different underlayers (Cr and Cu) onto polymer substrate. The thickness of Co and the underlayer were kept at 20nm and 180 nm, respectively. Microstructural and magnetic properties of these films have been analysed. In all films, the in plane anisotropy is confined in the direction perpendicular to the incident plane (transverse direction). However, the different microstructure of underlayers strongly affected properties of the magnetic layer. The Hc in the transverse direction are 180 and 80 kA/m for Cr and Cu, respectively.

Original language	Undefined
Pages (from-to)	2171-2172
Number of pages	2
Journal	Journal of magnetism and magnetic materials
Volume	272-27
Issue number	272-276
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.524
Publication status	Published - 2004

Keywords

Magnetic anisotropy
Underlayer
Polymer substrate
Thin film
IR-63019
EWI-5604
SMI-MAT: MATERIALS
SMI-TST: From 2006 in EWI-TST
METIS-218491
Oblique deposition

Access to Document

10.1016/j.jmmm.2003.12.524

http://eprints.eemcs.utwente.nl/secure2/5604/01/NGUYEN2004A.PDF

Cite this

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title = "Properties of obliquely sputtered Co on different underlayers on polymer substrate",

abstract = "Co films have been obliquely sputtered on different underlayers (Cr and Cu) onto polymer substrate. The thickness of Co and the underlayer were kept at 20nm and 180 nm, respectively. Microstructural and magnetic properties of these films have been analysed. In all films, the in plane anisotropy is confined in the direction perpendicular to the incident plane (transverse direction). However, the different microstructure of underlayers strongly affected properties of the magnetic layer. The Hc in the transverse direction are 180 and 80 kA/m for Cr and Cu, respectively.",

keywords = "Magnetic anisotropy, Underlayer, Polymer substrate, Thin film, IR-63019, EWI-5604, SMI-MAT: MATERIALS, SMI-TST: From 2006 in EWI-TST, METIS-218491, Oblique deposition",

author = "L.T. Nguyen and J.C. Lodder",

note = "Imported from SMI Reference manager",

year = "2004",

doi = "10.1016/j.jmmm.2003.12.524",

language = "Undefined",

volume = "272-27",

pages = "2171--2172",

journal = "Journal of magnetism and magnetic materials",

issn = "0304-8853",

publisher = "Elsevier",

number = "272-276",

}

TY - JOUR

T1 - Properties of obliquely sputtered Co on different underlayers on polymer substrate

AU - Nguyen, L.T.

AU - Lodder, J.C.

N1 - Imported from SMI Reference manager

PY - 2004

Y1 - 2004

N2 - Co films have been obliquely sputtered on different underlayers (Cr and Cu) onto polymer substrate. The thickness of Co and the underlayer were kept at 20nm and 180 nm, respectively. Microstructural and magnetic properties of these films have been analysed. In all films, the in plane anisotropy is confined in the direction perpendicular to the incident plane (transverse direction). However, the different microstructure of underlayers strongly affected properties of the magnetic layer. The Hc in the transverse direction are 180 and 80 kA/m for Cr and Cu, respectively.

AB - Co films have been obliquely sputtered on different underlayers (Cr and Cu) onto polymer substrate. The thickness of Co and the underlayer were kept at 20nm and 180 nm, respectively. Microstructural and magnetic properties of these films have been analysed. In all films, the in plane anisotropy is confined in the direction perpendicular to the incident plane (transverse direction). However, the different microstructure of underlayers strongly affected properties of the magnetic layer. The Hc in the transverse direction are 180 and 80 kA/m for Cr and Cu, respectively.

KW - Magnetic anisotropy

KW - Underlayer

KW - Polymer substrate

KW - Thin film

KW - IR-63019

KW - EWI-5604

KW - SMI-MAT: MATERIALS

KW - SMI-TST: From 2006 in EWI-TST

KW - METIS-218491

KW - Oblique deposition

U2 - 10.1016/j.jmmm.2003.12.524

DO - 10.1016/j.jmmm.2003.12.524

M3 - Article

SN - 0304-8853

VL - 272-27

SP - 2171

EP - 2172

JO - Journal of magnetism and magnetic materials

JF - Journal of magnetism and magnetic materials

IS - 272-276

ER -