Abstract
We present a method to deposit films with a range of doping concentrations/dilute alloys, from a single target in pulsed laser deposition (PLD). Cr-doped ZnS films were deposited by ablating a target consisting Cr particles (diameter 20–100 μm) embedded in a ZnS:Cr matrix. The Cr content in the film was varied in the range 2.0–5.0 at.% simply by varying the laser fluence, or by varying the number of pre-ablation pulses. Such a doping/composition range is normally not achieved using a single target in PLD. Details of the target ablation study, which is needed prior to the deposition, are also presented.
| Original language | English |
|---|---|
| Pages (from-to) | 28-32 |
| Number of pages | 5 |
| Journal | Thin solid films |
| Volume | 590 |
| DOIs | |
| Publication status | Published - 2015 |
| Externally published | Yes |
Keywords
- Cr doped ZnS
- Dilute alloys
- Doping semiconductors
- Laser ablation
- pulsed laser deposition
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